JPS52117558A - Soft x-ray exposure mask and its manufacturing method - Google Patents
Soft x-ray exposure mask and its manufacturing methodInfo
- Publication number
- JPS52117558A JPS52117558A JP3483376A JP3483376A JPS52117558A JP S52117558 A JPS52117558 A JP S52117558A JP 3483376 A JP3483376 A JP 3483376A JP 3483376 A JP3483376 A JP 3483376A JP S52117558 A JPS52117558 A JP S52117558A
- Authority
- JP
- Japan
- Prior art keywords
- soft
- ray exposure
- exposure mask
- manufacturing
- classifying
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To form mask pattern at inner side with thinner depth than circumference support material of Si substrate by classifying selective etching into two stages. As a result, soft X-ray exposure mask can be obtained with uniform surface.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51034833A JPS5923105B2 (en) | 1976-03-30 | 1976-03-30 | Manufacturing method for soft X-ray exposure mask |
US05/782,379 US4198263A (en) | 1976-03-30 | 1977-03-29 | Mask for soft X-rays and method of manufacture |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51034833A JPS5923105B2 (en) | 1976-03-30 | 1976-03-30 | Manufacturing method for soft X-ray exposure mask |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52117558A true JPS52117558A (en) | 1977-10-03 |
JPS5923105B2 JPS5923105B2 (en) | 1984-05-30 |
Family
ID=12425192
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP51034833A Expired JPS5923105B2 (en) | 1976-03-30 | 1976-03-30 | Manufacturing method for soft X-ray exposure mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5923105B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5312274A (en) * | 1976-07-21 | 1978-02-03 | Oki Electric Ind Co Ltd | Production of mask for x-ray exposure |
JPS5313879A (en) * | 1976-07-23 | 1978-02-07 | Nec Corp | Silicon mask for x-ray exposure and its production |
JPS56132343A (en) * | 1980-03-22 | 1981-10-16 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Mask for x-ray exposure and its manufacture |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6286002U (en) * | 1985-11-19 | 1987-06-01 | ||
JPH0446315U (en) * | 1990-08-24 | 1992-04-20 | ||
JPH0517097U (en) * | 1991-08-12 | 1993-03-05 | 積水ハウス株式会社 | Integrated post with stained light |
-
1976
- 1976-03-30 JP JP51034833A patent/JPS5923105B2/en not_active Expired
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5312274A (en) * | 1976-07-21 | 1978-02-03 | Oki Electric Ind Co Ltd | Production of mask for x-ray exposure |
JPS5444636B2 (en) * | 1976-07-21 | 1979-12-27 | ||
JPS5313879A (en) * | 1976-07-23 | 1978-02-07 | Nec Corp | Silicon mask for x-ray exposure and its production |
JPS541625B2 (en) * | 1976-07-23 | 1979-01-26 | ||
JPS56132343A (en) * | 1980-03-22 | 1981-10-16 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Mask for x-ray exposure and its manufacture |
JPS631740B2 (en) * | 1980-03-22 | 1988-01-13 | Cho Eru Esu Ai Gijutsu Kenkyu Kumiai |
Also Published As
Publication number | Publication date |
---|---|
JPS5923105B2 (en) | 1984-05-30 |
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