JPS5349953A - Soft x-ray transcription mask - Google Patents

Soft x-ray transcription mask

Info

Publication number
JPS5349953A
JPS5349953A JP12380776A JP12380776A JPS5349953A JP S5349953 A JPS5349953 A JP S5349953A JP 12380776 A JP12380776 A JP 12380776A JP 12380776 A JP12380776 A JP 12380776A JP S5349953 A JPS5349953 A JP S5349953A
Authority
JP
Japan
Prior art keywords
ray
soft
transcription mask
transcription
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12380776A
Other languages
Japanese (ja)
Inventor
Masaru Miyazaki
Kayao Takemoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12380776A priority Critical patent/JPS5349953A/en
Publication of JPS5349953A publication Critical patent/JPS5349953A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To secure the tensile force as well as to increase the intensity for a film by providing high-density B diffusion layer onto the rear surface opposite to the absorber pattern formation surface, and thus to obtain a soft X-ray transcription mask for micro patterns.
COPYRIGHT: (C)1978,JPO&Japio
JP12380776A 1976-10-18 1976-10-18 Soft x-ray transcription mask Pending JPS5349953A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12380776A JPS5349953A (en) 1976-10-18 1976-10-18 Soft x-ray transcription mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12380776A JPS5349953A (en) 1976-10-18 1976-10-18 Soft x-ray transcription mask

Publications (1)

Publication Number Publication Date
JPS5349953A true JPS5349953A (en) 1978-05-06

Family

ID=14869803

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12380776A Pending JPS5349953A (en) 1976-10-18 1976-10-18 Soft x-ray transcription mask

Country Status (1)

Country Link
JP (1) JPS5349953A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57198461A (en) * 1981-05-18 1982-12-06 Philips Nv Radiant lithographic mask and manufacture thereof
JPS63133524A (en) * 1986-11-25 1988-06-06 Matsushita Electronics Corp X-ray mask and manufacture thereof
JPH04269832A (en) * 1991-02-26 1992-09-25 Shin Etsu Chem Co Ltd Manufacture of mask for x-ray lithography
WO2002012115A2 (en) * 2000-08-08 2002-02-14 Honeywell International Inc. Methods for reducing the curvature in boron-doped silicon micromachined structures
WO2004051370A1 (en) * 2002-12-03 2004-06-17 Dai Nippon Printing Co., Ltd. Transfer mask blank, transfer mask, and transfer method using the transfer mask
EP2851749B1 (en) * 2013-09-23 2021-08-04 National Synchrotron Radiation Research Center X-ray mask structure and method for preparing the same

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57198461A (en) * 1981-05-18 1982-12-06 Philips Nv Radiant lithographic mask and manufacture thereof
JPH0319690B2 (en) * 1981-05-18 1991-03-15 Fuiritsupusu Furuuiranpenfuaburiken Nv
JPS63133524A (en) * 1986-11-25 1988-06-06 Matsushita Electronics Corp X-ray mask and manufacture thereof
JPH04269832A (en) * 1991-02-26 1992-09-25 Shin Etsu Chem Co Ltd Manufacture of mask for x-ray lithography
WO2002012115A2 (en) * 2000-08-08 2002-02-14 Honeywell International Inc. Methods for reducing the curvature in boron-doped silicon micromachined structures
WO2002012115A3 (en) * 2000-08-08 2003-01-09 Honeywell Int Inc Methods for reducing the curvature in boron-doped silicon micromachined structures
US6544655B1 (en) 2000-08-08 2003-04-08 Honeywell International Inc. Methods for reducing the curvature in boron-doped silicon micromachined structures
WO2004051370A1 (en) * 2002-12-03 2004-06-17 Dai Nippon Printing Co., Ltd. Transfer mask blank, transfer mask, and transfer method using the transfer mask
US7582393B2 (en) 2002-12-03 2009-09-01 Dai Nippon Printing Co., Ltd. Transfer mask blank, transfer mask, and transfer method using the transfer mask
EP2851749B1 (en) * 2013-09-23 2021-08-04 National Synchrotron Radiation Research Center X-ray mask structure and method for preparing the same

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