JPS5429975A - Photo mask - Google Patents
Photo maskInfo
- Publication number
- JPS5429975A JPS5429975A JP9504477A JP9504477A JPS5429975A JP S5429975 A JPS5429975 A JP S5429975A JP 9504477 A JP9504477 A JP 9504477A JP 9504477 A JP9504477 A JP 9504477A JP S5429975 A JPS5429975 A JP S5429975A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- photo mask
- photo
- resist
- defect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To prevent the defect of a resist pattern due to the adhesion between a mask reducing the free energy of the mask surface and a photo resist, by arranging fluoroalkyl groups on the surface of a photo mask.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52095044A JPS6040695B2 (en) | 1977-08-10 | 1977-08-10 | photo mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52095044A JPS6040695B2 (en) | 1977-08-10 | 1977-08-10 | photo mask |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5429975A true JPS5429975A (en) | 1979-03-06 |
JPS6040695B2 JPS6040695B2 (en) | 1985-09-12 |
Family
ID=14127061
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP52095044A Expired JPS6040695B2 (en) | 1977-08-10 | 1977-08-10 | photo mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6040695B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63300868A (en) * | 1987-05-29 | 1988-12-08 | Toyoda Mach Works Ltd | Electrodeposition grindstone |
JP2002214761A (en) * | 2001-01-16 | 2002-07-31 | Dainippon Printing Co Ltd | Photomask for photolithography and method for manufacturing the same |
US6565704B2 (en) * | 1998-07-08 | 2003-05-20 | Nitto Denko Corporation | Process for the removal of resist material |
-
1977
- 1977-08-10 JP JP52095044A patent/JPS6040695B2/en not_active Expired
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63300868A (en) * | 1987-05-29 | 1988-12-08 | Toyoda Mach Works Ltd | Electrodeposition grindstone |
US6565704B2 (en) * | 1998-07-08 | 2003-05-20 | Nitto Denko Corporation | Process for the removal of resist material |
JP2002214761A (en) * | 2001-01-16 | 2002-07-31 | Dainippon Printing Co Ltd | Photomask for photolithography and method for manufacturing the same |
Also Published As
Publication number | Publication date |
---|---|
JPS6040695B2 (en) | 1985-09-12 |
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