JPS5429975A - Photo mask - Google Patents

Photo mask

Info

Publication number
JPS5429975A
JPS5429975A JP9504477A JP9504477A JPS5429975A JP S5429975 A JPS5429975 A JP S5429975A JP 9504477 A JP9504477 A JP 9504477A JP 9504477 A JP9504477 A JP 9504477A JP S5429975 A JPS5429975 A JP S5429975A
Authority
JP
Japan
Prior art keywords
mask
photo mask
photo
resist
defect
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9504477A
Other languages
Japanese (ja)
Other versions
JPS6040695B2 (en
Inventor
Toshiharu Matsuzawa
Hiroshi Yanagisawa
Tetsukazu Hashimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP52095044A priority Critical patent/JPS6040695B2/en
Publication of JPS5429975A publication Critical patent/JPS5429975A/en
Publication of JPS6040695B2 publication Critical patent/JPS6040695B2/en
Expired legal-status Critical Current

Links

Abstract

PURPOSE: To prevent the defect of a resist pattern due to the adhesion between a mask reducing the free energy of the mask surface and a photo resist, by arranging fluoroalkyl groups on the surface of a photo mask.
COPYRIGHT: (C)1979,JPO&Japio
JP52095044A 1977-08-10 1977-08-10 photo mask Expired JPS6040695B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52095044A JPS6040695B2 (en) 1977-08-10 1977-08-10 photo mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52095044A JPS6040695B2 (en) 1977-08-10 1977-08-10 photo mask

Publications (2)

Publication Number Publication Date
JPS5429975A true JPS5429975A (en) 1979-03-06
JPS6040695B2 JPS6040695B2 (en) 1985-09-12

Family

ID=14127061

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52095044A Expired JPS6040695B2 (en) 1977-08-10 1977-08-10 photo mask

Country Status (1)

Country Link
JP (1) JPS6040695B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63300868A (en) * 1987-05-29 1988-12-08 Toyoda Mach Works Ltd Electrodeposition grindstone
JP2002214761A (en) * 2001-01-16 2002-07-31 Dainippon Printing Co Ltd Photomask for photolithography and method for manufacturing the same
US6565704B2 (en) * 1998-07-08 2003-05-20 Nitto Denko Corporation Process for the removal of resist material

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63300868A (en) * 1987-05-29 1988-12-08 Toyoda Mach Works Ltd Electrodeposition grindstone
US6565704B2 (en) * 1998-07-08 2003-05-20 Nitto Denko Corporation Process for the removal of resist material
JP2002214761A (en) * 2001-01-16 2002-07-31 Dainippon Printing Co Ltd Photomask for photolithography and method for manufacturing the same

Also Published As

Publication number Publication date
JPS6040695B2 (en) 1985-09-12

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