JPS5365667A - Optical mask - Google Patents
Optical maskInfo
- Publication number
- JPS5365667A JPS5365667A JP14167776A JP14167776A JPS5365667A JP S5365667 A JPS5365667 A JP S5365667A JP 14167776 A JP14167776 A JP 14167776A JP 14167776 A JP14167776 A JP 14167776A JP S5365667 A JPS5365667 A JP S5365667A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- optical mask
- master
- mask surface
- 2w3μm
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE: To avoid an attachment between the master mask and the print mask at the pattern region by making the scribe region of the master mask surface protrude by 2W3μm over the mask surface. As a result, the adhesion of the masks to each other and the exfoliation of the resist can be avoided.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14167776A JPS5365667A (en) | 1976-11-24 | 1976-11-24 | Optical mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14167776A JPS5365667A (en) | 1976-11-24 | 1976-11-24 | Optical mask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5365667A true JPS5365667A (en) | 1978-06-12 |
Family
ID=15297622
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14167776A Pending JPS5365667A (en) | 1976-11-24 | 1976-11-24 | Optical mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5365667A (en) |
-
1976
- 1976-11-24 JP JP14167776A patent/JPS5365667A/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS51120180A (en) | Pattern printing device | |
JPS5321576A (en) | Mask for x-ray exposure | |
JPS5361280A (en) | Pattern projector | |
JPS51126073A (en) | Pattern printing equpment made available by photo-etching method | |
JPS5349953A (en) | Soft x-ray transcription mask | |
JPS5365667A (en) | Optical mask | |
JPS5429975A (en) | Photo mask | |
JPS5389673A (en) | Fine pattern forming method of semiconductor device | |
JPS53117384A (en) | Photoetching mask | |
JPS52143772A (en) | Alignment method of masks using special reference marks | |
JPS5435681A (en) | Alignment device | |
JPS5277670A (en) | Semiconductive device | |
JPS52117072A (en) | Hard mask | |
JPS51139267A (en) | Photo-mask | |
JPS532082A (en) | Photo etching mask | |
JPS5399772A (en) | Optical mask | |
JPS53105982A (en) | Micropattern formation method | |
JPS5215266A (en) | Pattern printing unit | |
JPS52152171A (en) | Wafer alignment method | |
JPS5379387A (en) | Optical mask | |
JPS545659A (en) | Manufacture of semiconductor device | |
JPS52156567A (en) | Production of photo mask | |
JPS52130292A (en) | Patterning method | |
JPS5384477A (en) | Forming method of dry etching mask | |
JPS5555528A (en) | Mask aligner |