JPS5215266A - Pattern printing unit - Google Patents

Pattern printing unit

Info

Publication number
JPS5215266A
JPS5215266A JP50090916A JP9091675A JPS5215266A JP S5215266 A JPS5215266 A JP S5215266A JP 50090916 A JP50090916 A JP 50090916A JP 9091675 A JP9091675 A JP 9091675A JP S5215266 A JPS5215266 A JP S5215266A
Authority
JP
Japan
Prior art keywords
printing unit
pattern printing
wafers
large areas
projection method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50090916A
Other languages
Japanese (ja)
Inventor
Takashi Komata
Kazuya Matsumoto
Ichiro Kano
Akiyoshi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP50090916A priority Critical patent/JPS5215266A/en
Publication of JPS5215266A publication Critical patent/JPS5215266A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To obtain a pattern printing unit which easily prints photo masks of large areas on the photo resist layers of wafers by the projection method.
COPYRIGHT: (C)1977,JPO&Japio
JP50090916A 1975-07-25 1975-07-25 Pattern printing unit Pending JPS5215266A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50090916A JPS5215266A (en) 1975-07-25 1975-07-25 Pattern printing unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50090916A JPS5215266A (en) 1975-07-25 1975-07-25 Pattern printing unit

Publications (1)

Publication Number Publication Date
JPS5215266A true JPS5215266A (en) 1977-02-04

Family

ID=14011734

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50090916A Pending JPS5215266A (en) 1975-07-25 1975-07-25 Pattern printing unit

Country Status (1)

Country Link
JP (1) JPS5215266A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6090339A (en) * 1984-07-04 1985-05-21 Hitachi Ltd Light irradiating device
JPH07135165A (en) * 1993-11-11 1995-05-23 Nikon Corp Scanning aligner
US6509954B1 (en) 1993-06-30 2003-01-21 Nikon Corporation Aperture stop having central aperture region defined by a circular ARC and peripheral region with decreased width, and exposure apparatus and method

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6090339A (en) * 1984-07-04 1985-05-21 Hitachi Ltd Light irradiating device
US6509954B1 (en) 1993-06-30 2003-01-21 Nikon Corporation Aperture stop having central aperture region defined by a circular ARC and peripheral region with decreased width, and exposure apparatus and method
US6795169B2 (en) 1993-06-30 2004-09-21 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
US7023527B2 (en) 1993-06-30 2006-04-04 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
US7088425B2 (en) 1993-06-30 2006-08-08 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
JPH07135165A (en) * 1993-11-11 1995-05-23 Nikon Corp Scanning aligner

Similar Documents

Publication Publication Date Title
JPS51120180A (en) Pattern printing device
JPS5339075A (en) Step and repeat exposure method of masks
JPS5228875A (en) Mask
JPS5211774A (en) Method of detecting relative position of patterns
JPS5215266A (en) Pattern printing unit
JPS51126073A (en) Pattern printing equpment made available by photo-etching method
JPS5361280A (en) Pattern projector
JPS5373073A (en) Treatment method for photo resist
JPS5389673A (en) Fine pattern forming method of semiconductor device
JPS51139267A (en) Photo-mask
JPS52143772A (en) Alignment method of masks using special reference marks
JPS5277671A (en) Method and equipment of masking
JPS5272175A (en) Mask patterning of resist meterial
JPS5283064A (en) Regist film forming method
JPS5382173A (en) Positioning method
JPS5251870A (en) Electron bean exposure method
JPS5228267A (en) Minute processing
JPS51148370A (en) Electron ray exposure method
JPS532082A (en) Photo etching mask
JPS51151073A (en) Method to adjust the position of an mask for an integrated circuit
JPS5313880A (en) Fine patterning method
JPS5429975A (en) Photo mask
JPS53104173A (en) Master reticle for photo mask production
JPS5357973A (en) Preparation of photo mask
JPS51124380A (en) Photo mask