JPS5339075A - Step and repeat exposure method of masks - Google Patents

Step and repeat exposure method of masks

Info

Publication number
JPS5339075A
JPS5339075A JP11312476A JP11312476A JPS5339075A JP S5339075 A JPS5339075 A JP S5339075A JP 11312476 A JP11312476 A JP 11312476A JP 11312476 A JP11312476 A JP 11312476A JP S5339075 A JPS5339075 A JP S5339075A
Authority
JP
Japan
Prior art keywords
patterns
masks
exposure method
repeat exposure
reguired
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11312476A
Other languages
Japanese (ja)
Other versions
JPS6058576B2 (en
Inventor
Morihisa Hoko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP51113124A priority Critical patent/JPS6058576B2/en
Publication of JPS5339075A publication Critical patent/JPS5339075A/en
Publication of JPS6058576B2 publication Critical patent/JPS6058576B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To enhance mask alignment accuracy and improve workability by beforehand putting plural kinds of patterns within a single original plate, covering the patterns which are required for the moment out of these patterns and exposing only the reguired patterns.
COPYRIGHT: (C)1978,JPO&Japio
JP51113124A 1976-09-22 1976-09-22 Exposure method and exposure equipment used for it Expired JPS6058576B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51113124A JPS6058576B2 (en) 1976-09-22 1976-09-22 Exposure method and exposure equipment used for it

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51113124A JPS6058576B2 (en) 1976-09-22 1976-09-22 Exposure method and exposure equipment used for it

Publications (2)

Publication Number Publication Date
JPS5339075A true JPS5339075A (en) 1978-04-10
JPS6058576B2 JPS6058576B2 (en) 1985-12-20

Family

ID=14604124

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51113124A Expired JPS6058576B2 (en) 1976-09-22 1976-09-22 Exposure method and exposure equipment used for it

Country Status (1)

Country Link
JP (1) JPS6058576B2 (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55129333A (en) * 1979-03-28 1980-10-07 Hitachi Ltd Scale-down projection aligner and mask used for this
JPS5612644A (en) * 1979-07-12 1981-02-07 Matsushita Electric Ind Co Ltd Manufacture of photomask
JPS5632142A (en) * 1979-08-23 1981-04-01 Fujitsu Ltd Multichip constitution reticle
JPS57124732A (en) * 1981-01-27 1982-08-03 Nec Corp Manufacture of mask for automatic registering
JPS61105104U (en) * 1984-12-14 1986-07-04
JPS61105107U (en) * 1984-12-14 1986-07-04
JPS6379318A (en) * 1987-09-11 1988-04-09 Hitachi Ltd Reduction projection exposure method
JPH01235954A (en) * 1988-03-17 1989-09-20 Fujitsu Ltd Reticle for lithography and reticle pattern transfer method
EP1189111A1 (en) * 1999-05-27 2002-03-20 Kem-Tec Japan Co., Ltd Production device for printed board, production method for printed board and printed board

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0410142Y2 (en) * 1984-10-20 1992-03-12

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55129333A (en) * 1979-03-28 1980-10-07 Hitachi Ltd Scale-down projection aligner and mask used for this
JPS5612644A (en) * 1979-07-12 1981-02-07 Matsushita Electric Ind Co Ltd Manufacture of photomask
JPS5632142A (en) * 1979-08-23 1981-04-01 Fujitsu Ltd Multichip constitution reticle
JPS57124732A (en) * 1981-01-27 1982-08-03 Nec Corp Manufacture of mask for automatic registering
JPS61105104U (en) * 1984-12-14 1986-07-04
JPS61105107U (en) * 1984-12-14 1986-07-04
JPS6379318A (en) * 1987-09-11 1988-04-09 Hitachi Ltd Reduction projection exposure method
JPH01235954A (en) * 1988-03-17 1989-09-20 Fujitsu Ltd Reticle for lithography and reticle pattern transfer method
EP1189111A1 (en) * 1999-05-27 2002-03-20 Kem-Tec Japan Co., Ltd Production device for printed board, production method for printed board and printed board
EP1189111A4 (en) * 1999-05-27 2002-11-06 Kem Tec Japan Co Ltd Production device for printed board, production method for printed board and printed board

Also Published As

Publication number Publication date
JPS6058576B2 (en) 1985-12-20

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