JPS5339075A - Step and repeat exposure method of masks - Google Patents
Step and repeat exposure method of masksInfo
- Publication number
- JPS5339075A JPS5339075A JP11312476A JP11312476A JPS5339075A JP S5339075 A JPS5339075 A JP S5339075A JP 11312476 A JP11312476 A JP 11312476A JP 11312476 A JP11312476 A JP 11312476A JP S5339075 A JPS5339075 A JP S5339075A
- Authority
- JP
- Japan
- Prior art keywords
- patterns
- masks
- exposure method
- repeat exposure
- reguired
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To enhance mask alignment accuracy and improve workability by beforehand putting plural kinds of patterns within a single original plate, covering the patterns which are required for the moment out of these patterns and exposing only the reguired patterns.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51113124A JPS6058576B2 (en) | 1976-09-22 | 1976-09-22 | Exposure method and exposure equipment used for it |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51113124A JPS6058576B2 (en) | 1976-09-22 | 1976-09-22 | Exposure method and exposure equipment used for it |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5339075A true JPS5339075A (en) | 1978-04-10 |
JPS6058576B2 JPS6058576B2 (en) | 1985-12-20 |
Family
ID=14604124
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP51113124A Expired JPS6058576B2 (en) | 1976-09-22 | 1976-09-22 | Exposure method and exposure equipment used for it |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6058576B2 (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55129333A (en) * | 1979-03-28 | 1980-10-07 | Hitachi Ltd | Scale-down projection aligner and mask used for this |
JPS5612644A (en) * | 1979-07-12 | 1981-02-07 | Matsushita Electric Ind Co Ltd | Manufacture of photomask |
JPS5632142A (en) * | 1979-08-23 | 1981-04-01 | Fujitsu Ltd | Multichip constitution reticle |
JPS57124732A (en) * | 1981-01-27 | 1982-08-03 | Nec Corp | Manufacture of mask for automatic registering |
JPS61105104U (en) * | 1984-12-14 | 1986-07-04 | ||
JPS61105107U (en) * | 1984-12-14 | 1986-07-04 | ||
JPS6379318A (en) * | 1987-09-11 | 1988-04-09 | Hitachi Ltd | Reduction projection exposure method |
JPH01235954A (en) * | 1988-03-17 | 1989-09-20 | Fujitsu Ltd | Reticle for lithography and reticle pattern transfer method |
EP1189111A1 (en) * | 1999-05-27 | 2002-03-20 | Kem-Tec Japan Co., Ltd | Production device for printed board, production method for printed board and printed board |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0410142Y2 (en) * | 1984-10-20 | 1992-03-12 |
-
1976
- 1976-09-22 JP JP51113124A patent/JPS6058576B2/en not_active Expired
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55129333A (en) * | 1979-03-28 | 1980-10-07 | Hitachi Ltd | Scale-down projection aligner and mask used for this |
JPS5612644A (en) * | 1979-07-12 | 1981-02-07 | Matsushita Electric Ind Co Ltd | Manufacture of photomask |
JPS5632142A (en) * | 1979-08-23 | 1981-04-01 | Fujitsu Ltd | Multichip constitution reticle |
JPS57124732A (en) * | 1981-01-27 | 1982-08-03 | Nec Corp | Manufacture of mask for automatic registering |
JPS61105104U (en) * | 1984-12-14 | 1986-07-04 | ||
JPS61105107U (en) * | 1984-12-14 | 1986-07-04 | ||
JPS6379318A (en) * | 1987-09-11 | 1988-04-09 | Hitachi Ltd | Reduction projection exposure method |
JPH01235954A (en) * | 1988-03-17 | 1989-09-20 | Fujitsu Ltd | Reticle for lithography and reticle pattern transfer method |
EP1189111A1 (en) * | 1999-05-27 | 2002-03-20 | Kem-Tec Japan Co., Ltd | Production device for printed board, production method for printed board and printed board |
EP1189111A4 (en) * | 1999-05-27 | 2002-11-06 | Kem Tec Japan Co Ltd | Production device for printed board, production method for printed board and printed board |
Also Published As
Publication number | Publication date |
---|---|
JPS6058576B2 (en) | 1985-12-20 |
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