JPS5612644A - Manufacture of photomask - Google Patents

Manufacture of photomask

Info

Publication number
JPS5612644A
JPS5612644A JP8887279A JP8887279A JPS5612644A JP S5612644 A JPS5612644 A JP S5612644A JP 8887279 A JP8887279 A JP 8887279A JP 8887279 A JP8887279 A JP 8887279A JP S5612644 A JPS5612644 A JP S5612644A
Authority
JP
Japan
Prior art keywords
reticle
patterns
chip
photomask
size
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8887279A
Other languages
Japanese (ja)
Inventor
Kazuhiko Tsuji
Shuji Kondo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP8887279A priority Critical patent/JPS5612644A/en
Publication of JPS5612644A publication Critical patent/JPS5612644A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To obtain a photomask with high accuracy by making chips of different patterns about equal in plane size and forming two or more kinds of chip patterns on one reticle to make reticle exchange unnecessary in projection exposure and prevent pattern disagreement between chips. CONSTITUTION:In a process of manufacturing photomask 11 having two or more kinds of chip patterns 12, 13, patterns 12, 13 are made equal in size, and reticles 14, 15 having 10-time size are formed on the same reticle 16 as one pair. Reticle 16 is set in a photorepeater, and the feed extent of the repeater is regulated to size l of one chip pattern. One chip pattern 15 is first shielded, and the other chip patterns 12 alone are successively projected on a photomask and exposed at step feed extent l. Similar processing is then carried out to make reticle exchange unnecessary.
JP8887279A 1979-07-12 1979-07-12 Manufacture of photomask Pending JPS5612644A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8887279A JPS5612644A (en) 1979-07-12 1979-07-12 Manufacture of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8887279A JPS5612644A (en) 1979-07-12 1979-07-12 Manufacture of photomask

Publications (1)

Publication Number Publication Date
JPS5612644A true JPS5612644A (en) 1981-02-07

Family

ID=13955091

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8887279A Pending JPS5612644A (en) 1979-07-12 1979-07-12 Manufacture of photomask

Country Status (1)

Country Link
JP (1) JPS5612644A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4869998A (en) * 1986-05-01 1989-09-26 Smiths Industries Public Limited Company Intergrated circuit substrates
US5705299A (en) * 1992-12-16 1998-01-06 Texas Instruments Incorporated Large die photolithography
US8513777B2 (en) 2008-06-27 2013-08-20 Fujitsu Semiconductor Limited Method and apparatus for generating reticle data

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5226902A (en) * 1975-08-25 1977-02-28 Hitachi Ltd Method of making photomask pattern
JPS5339075A (en) * 1976-09-22 1978-04-10 Hitachi Ltd Step and repeat exposure method of masks

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5226902A (en) * 1975-08-25 1977-02-28 Hitachi Ltd Method of making photomask pattern
JPS5339075A (en) * 1976-09-22 1978-04-10 Hitachi Ltd Step and repeat exposure method of masks

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4869998A (en) * 1986-05-01 1989-09-26 Smiths Industries Public Limited Company Intergrated circuit substrates
US5705299A (en) * 1992-12-16 1998-01-06 Texas Instruments Incorporated Large die photolithography
USRE38126E1 (en) * 1992-12-16 2003-05-27 Texas Instruments Incorporated Large die photolithography
US8513777B2 (en) 2008-06-27 2013-08-20 Fujitsu Semiconductor Limited Method and apparatus for generating reticle data

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