JPS5687322A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS5687322A
JPS5687322A JP16440379A JP16440379A JPS5687322A JP S5687322 A JPS5687322 A JP S5687322A JP 16440379 A JP16440379 A JP 16440379A JP 16440379 A JP16440379 A JP 16440379A JP S5687322 A JPS5687322 A JP S5687322A
Authority
JP
Japan
Prior art keywords
mask
lights
photomask
repeats
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16440379A
Other languages
Japanese (ja)
Inventor
Masaru Yoshino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP16440379A priority Critical patent/JPS5687322A/en
Publication of JPS5687322A publication Critical patent/JPS5687322A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To remove influences by dust on a mask by a method wherein the mask is shifted and exposed to lights twice through a photomask having etching patterns which have repeats in numbers excess by one or more than necessary numbers. CONSTITUTION:The photomask 1 composed of a white part 2 penetrated by lights and a part 3 shutting off the lights coming in is formed so as to have parts of the patterns 4, 5 which have the repeats in numbers excess by one or more against a pattern 6 having a plurality of te repeats in the central part, and after the first time light sensitive pattern is formed on a light sensitive resin by the photomask, the mask is exposed to lights for the second time repeatedly shifted as much as the part of the pattern and developed. Whereby the influences by dust on the mask are removed without washing the mask and the semiconductor can be manufactured in good yield.
JP16440379A 1979-12-17 1979-12-17 Manufacture of semiconductor device Pending JPS5687322A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16440379A JPS5687322A (en) 1979-12-17 1979-12-17 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16440379A JPS5687322A (en) 1979-12-17 1979-12-17 Manufacture of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5687322A true JPS5687322A (en) 1981-07-15

Family

ID=15792463

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16440379A Pending JPS5687322A (en) 1979-12-17 1979-12-17 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5687322A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0225623A2 (en) * 1985-12-09 1987-06-16 Casio Computer Company Limited A method for manufacturing a color filter
JPS62153858A (en) * 1985-12-21 1987-07-08 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Generation of pattern of photoresist

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0225623A2 (en) * 1985-12-09 1987-06-16 Casio Computer Company Limited A method for manufacturing a color filter
EP0225623A3 (en) * 1985-12-09 1989-07-12 Casio Computer Company Limited A method for manufacturing a color filter
US5008166A (en) * 1985-12-09 1991-04-16 Casio Computer Co., Ltd. Method for manufacturing a color filter
JPS62153858A (en) * 1985-12-21 1987-07-08 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Generation of pattern of photoresist

Similar Documents

Publication Publication Date Title
JPS56122128A (en) Positioning system for printing device of semiconductor or the like
DE3789999D1 (en) Photoresist process for reactive ion etching of metal patterns for semiconductor components.
JPS5687322A (en) Manufacture of semiconductor device
EP0338889A3 (en) Process for forming dicing lines on wafer
JPS6438747A (en) Production of photomask
JPS5651827A (en) Preparation of semiconductor device
JPS5743420A (en) Mask alignment method
JPS5431282A (en) Pattern formation method
JPS56137632A (en) Pattern forming
JPS5788451A (en) Photomask
JPS6421450A (en) Production of mask
JPS6459231A (en) Mask layout method for semiconductor integrated circuit
JPS6455826A (en) Manufacture of semiconductor device
JPS5277671A (en) Method and equipment of masking
JPS56162834A (en) Semiconductor device
JPS5587149A (en) Photomask for preparation of semiconductor wafer
JPS5578531A (en) Semiconductor substrate
JPS5223283A (en) Semiconductor light receiving device
JPS534477A (en) Production of semiconductor device
JPS5491183A (en) Production of semiconductor device
JPS5299773A (en) Forming method for small size regions
JPS52147974A (en) Manufacture of semiconductor device
JPS56116624A (en) Manufacture of semiconductor device
JPS5656633A (en) Manufacture of semiconductor element
JPS5315769A (en) Production of semiconductor device