JPS5315769A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS5315769A
JPS5315769A JP8994176A JP8994176A JPS5315769A JP S5315769 A JPS5315769 A JP S5315769A JP 8994176 A JP8994176 A JP 8994176A JP 8994176 A JP8994176 A JP 8994176A JP S5315769 A JPS5315769 A JP S5315769A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
patterns
pattern
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8994176A
Other languages
Japanese (ja)
Inventor
Kazumasa Ono
Kazuhide Kiuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP8994176A priority Critical patent/JPS5315769A/en
Publication of JPS5315769A publication Critical patent/JPS5315769A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To accurately form fine patterns by forming a pattern using a second mask allowing for the change component of the relative relation of the patterns on a substrate before and after intermediate treatment.
JP8994176A 1976-07-28 1976-07-28 Production of semiconductor device Pending JPS5315769A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8994176A JPS5315769A (en) 1976-07-28 1976-07-28 Production of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8994176A JPS5315769A (en) 1976-07-28 1976-07-28 Production of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5315769A true JPS5315769A (en) 1978-02-14

Family

ID=13984718

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8994176A Pending JPS5315769A (en) 1976-07-28 1976-07-28 Production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5315769A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10435072B2 (en) 2017-03-17 2019-10-08 Ford Global Technologies, Llc Road camber compensation

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10435072B2 (en) 2017-03-17 2019-10-08 Ford Global Technologies, Llc Road camber compensation

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