JPS5361286A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS5361286A
JPS5361286A JP13640776A JP13640776A JPS5361286A JP S5361286 A JPS5361286 A JP S5361286A JP 13640776 A JP13640776 A JP 13640776A JP 13640776 A JP13640776 A JP 13640776A JP S5361286 A JPS5361286 A JP S5361286A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
increase
integration
resolution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13640776A
Other languages
Japanese (ja)
Other versions
JPS5917541B2 (en
Inventor
Michio Ichikawa
Yoshiaki Inoue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP13640776A priority Critical patent/JPS5917541B2/en
Publication of JPS5361286A publication Critical patent/JPS5361286A/en
Publication of JPS5917541B2 publication Critical patent/JPS5917541B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Weting (AREA)

Abstract

PURPOSE: To increase the resolution of pattern, obtain fine patterns and increase the scale of integration by providing the processes of performing exposure through the use of a positive type photoresist then applying baking and making development.
COPYRIGHT: (C)1978,JPO&Japio
JP13640776A 1976-11-15 1976-11-15 Manufacturing method of semiconductor device Expired JPS5917541B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13640776A JPS5917541B2 (en) 1976-11-15 1976-11-15 Manufacturing method of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13640776A JPS5917541B2 (en) 1976-11-15 1976-11-15 Manufacturing method of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5361286A true JPS5361286A (en) 1978-06-01
JPS5917541B2 JPS5917541B2 (en) 1984-04-21

Family

ID=15174432

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13640776A Expired JPS5917541B2 (en) 1976-11-15 1976-11-15 Manufacturing method of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5917541B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57199222A (en) * 1981-06-02 1982-12-07 Nippon Telegr & Teleph Corp <Ntt> Control of cross-section of lift-off resist stencil

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57199222A (en) * 1981-06-02 1982-12-07 Nippon Telegr & Teleph Corp <Ntt> Control of cross-section of lift-off resist stencil

Also Published As

Publication number Publication date
JPS5917541B2 (en) 1984-04-21

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