JPS52149978A - Developing treatment method of photoresist film - Google Patents

Developing treatment method of photoresist film

Info

Publication number
JPS52149978A
JPS52149978A JP6655076A JP6655076A JPS52149978A JP S52149978 A JPS52149978 A JP S52149978A JP 6655076 A JP6655076 A JP 6655076A JP 6655076 A JP6655076 A JP 6655076A JP S52149978 A JPS52149978 A JP S52149978A
Authority
JP
Japan
Prior art keywords
treatment method
developing treatment
photoresist film
developing
resist film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6655076A
Other languages
Japanese (ja)
Other versions
JPS5941300B2 (en
Inventor
Tetsujiro Kotani
Tamotsu Sasaki
Masato Ishioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP6655076A priority Critical patent/JPS5941300B2/en
Publication of JPS52149978A publication Critical patent/JPS52149978A/en
Publication of JPS5941300B2 publication Critical patent/JPS5941300B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To perform developing treatment of photo resist film rapidly and accurately without causing uneven development by dropping developing solution onto the photo resist film prior to spraying thereby making uniform developing.
COPYRIGHT: (C)1977,JPO&Japio
JP6655076A 1976-06-09 1976-06-09 Development processing equipment Expired JPS5941300B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6655076A JPS5941300B2 (en) 1976-06-09 1976-06-09 Development processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6655076A JPS5941300B2 (en) 1976-06-09 1976-06-09 Development processing equipment

Publications (2)

Publication Number Publication Date
JPS52149978A true JPS52149978A (en) 1977-12-13
JPS5941300B2 JPS5941300B2 (en) 1984-10-05

Family

ID=13319120

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6655076A Expired JPS5941300B2 (en) 1976-06-09 1976-06-09 Development processing equipment

Country Status (1)

Country Link
JP (1) JPS5941300B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5596944A (en) * 1979-01-17 1980-07-23 Matsushita Electric Ind Co Ltd Developing method
JPS55133054U (en) * 1979-03-13 1980-09-20
JPS55124232A (en) * 1979-03-20 1980-09-25 Matsushita Electric Ind Co Ltd Application method of substrate treatment solution and the device therefor
JPS5732445A (en) * 1980-08-01 1982-02-22 Nec Corp Developing method for photoresist
DE3225575A1 (en) 1981-07-08 1983-03-31 Pioneer Electronic Corp., Tokyo METHOD AND DEVICE FOR DEVELOPING A PHOTO RESIST MATERIAL
JPS63232431A (en) * 1987-03-20 1988-09-28 Tokyo Electron Ltd Development device

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5596944A (en) * 1979-01-17 1980-07-23 Matsushita Electric Ind Co Ltd Developing method
JPS6053305B2 (en) * 1979-01-17 1985-11-25 松下電器産業株式会社 Development method
JPS55133054U (en) * 1979-03-13 1980-09-20
JPS55124232A (en) * 1979-03-20 1980-09-25 Matsushita Electric Ind Co Ltd Application method of substrate treatment solution and the device therefor
JPS5732445A (en) * 1980-08-01 1982-02-22 Nec Corp Developing method for photoresist
DE3225575A1 (en) 1981-07-08 1983-03-31 Pioneer Electronic Corp., Tokyo METHOD AND DEVICE FOR DEVELOPING A PHOTO RESIST MATERIAL
JPS63232431A (en) * 1987-03-20 1988-09-28 Tokyo Electron Ltd Development device
JPH0740545B2 (en) * 1987-03-20 1995-05-01 東京エレクトロン株式会社 Development method

Also Published As

Publication number Publication date
JPS5941300B2 (en) 1984-10-05

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