JPS52149978A - Developing treatment method of photoresist film - Google Patents
Developing treatment method of photoresist filmInfo
- Publication number
- JPS52149978A JPS52149978A JP6655076A JP6655076A JPS52149978A JP S52149978 A JPS52149978 A JP S52149978A JP 6655076 A JP6655076 A JP 6655076A JP 6655076 A JP6655076 A JP 6655076A JP S52149978 A JPS52149978 A JP S52149978A
- Authority
- JP
- Japan
- Prior art keywords
- treatment method
- developing treatment
- photoresist film
- developing
- resist film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To perform developing treatment of photo resist film rapidly and accurately without causing uneven development by dropping developing solution onto the photo resist film prior to spraying thereby making uniform developing.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6655076A JPS5941300B2 (en) | 1976-06-09 | 1976-06-09 | Development processing equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6655076A JPS5941300B2 (en) | 1976-06-09 | 1976-06-09 | Development processing equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52149978A true JPS52149978A (en) | 1977-12-13 |
JPS5941300B2 JPS5941300B2 (en) | 1984-10-05 |
Family
ID=13319120
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6655076A Expired JPS5941300B2 (en) | 1976-06-09 | 1976-06-09 | Development processing equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5941300B2 (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5596944A (en) * | 1979-01-17 | 1980-07-23 | Matsushita Electric Ind Co Ltd | Developing method |
JPS55133054U (en) * | 1979-03-13 | 1980-09-20 | ||
JPS55124232A (en) * | 1979-03-20 | 1980-09-25 | Matsushita Electric Ind Co Ltd | Application method of substrate treatment solution and the device therefor |
JPS5732445A (en) * | 1980-08-01 | 1982-02-22 | Nec Corp | Developing method for photoresist |
DE3225575A1 (en) | 1981-07-08 | 1983-03-31 | Pioneer Electronic Corp., Tokyo | METHOD AND DEVICE FOR DEVELOPING A PHOTO RESIST MATERIAL |
JPS63232431A (en) * | 1987-03-20 | 1988-09-28 | Tokyo Electron Ltd | Development device |
-
1976
- 1976-06-09 JP JP6655076A patent/JPS5941300B2/en not_active Expired
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5596944A (en) * | 1979-01-17 | 1980-07-23 | Matsushita Electric Ind Co Ltd | Developing method |
JPS6053305B2 (en) * | 1979-01-17 | 1985-11-25 | 松下電器産業株式会社 | Development method |
JPS55133054U (en) * | 1979-03-13 | 1980-09-20 | ||
JPS55124232A (en) * | 1979-03-20 | 1980-09-25 | Matsushita Electric Ind Co Ltd | Application method of substrate treatment solution and the device therefor |
JPS5732445A (en) * | 1980-08-01 | 1982-02-22 | Nec Corp | Developing method for photoresist |
DE3225575A1 (en) | 1981-07-08 | 1983-03-31 | Pioneer Electronic Corp., Tokyo | METHOD AND DEVICE FOR DEVELOPING A PHOTO RESIST MATERIAL |
JPS63232431A (en) * | 1987-03-20 | 1988-09-28 | Tokyo Electron Ltd | Development device |
JPH0740545B2 (en) * | 1987-03-20 | 1995-05-01 | 東京エレクトロン株式会社 | Development method |
Also Published As
Publication number | Publication date |
---|---|
JPS5941300B2 (en) | 1984-10-05 |
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