JPS5299775A - Pattern exposing method - Google Patents

Pattern exposing method

Info

Publication number
JPS5299775A
JPS5299775A JP1602676A JP1602676A JPS5299775A JP S5299775 A JPS5299775 A JP S5299775A JP 1602676 A JP1602676 A JP 1602676A JP 1602676 A JP1602676 A JP 1602676A JP S5299775 A JPS5299775 A JP S5299775A
Authority
JP
Japan
Prior art keywords
pattern exposing
exposing method
pattern
mask
occurrence
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1602676A
Other languages
Japanese (ja)
Inventor
Shigeo Yamashita
Kunio Aiki
Michiharu Nakamura
Junichi Umeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1602676A priority Critical patent/JPS5299775A/en
Publication of JPS5299775A publication Critical patent/JPS5299775A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To prevent the occurrence of interference fringes by providing a sufficient space between a mask and a material to be exposed, then performing exposing.
COPYRIGHT: (C)1977,JPO&Japio
JP1602676A 1976-02-18 1976-02-18 Pattern exposing method Pending JPS5299775A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1602676A JPS5299775A (en) 1976-02-18 1976-02-18 Pattern exposing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1602676A JPS5299775A (en) 1976-02-18 1976-02-18 Pattern exposing method

Publications (1)

Publication Number Publication Date
JPS5299775A true JPS5299775A (en) 1977-08-22

Family

ID=11905044

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1602676A Pending JPS5299775A (en) 1976-02-18 1976-02-18 Pattern exposing method

Country Status (1)

Country Link
JP (1) JPS5299775A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63316434A (en) * 1987-06-18 1988-12-23 Nippon Telegr & Teleph Corp <Ntt> X-ray exposure
JP2009288608A (en) * 2008-05-30 2009-12-10 Toppan Printing Co Ltd Method for manufacturing optical component, and color filter

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63316434A (en) * 1987-06-18 1988-12-23 Nippon Telegr & Teleph Corp <Ntt> X-ray exposure
JP2009288608A (en) * 2008-05-30 2009-12-10 Toppan Printing Co Ltd Method for manufacturing optical component, and color filter

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