JPS52117077A - Electron beam-exposing method - Google Patents

Electron beam-exposing method

Info

Publication number
JPS52117077A
JPS52117077A JP3462776A JP3462776A JPS52117077A JP S52117077 A JPS52117077 A JP S52117077A JP 3462776 A JP3462776 A JP 3462776A JP 3462776 A JP3462776 A JP 3462776A JP S52117077 A JPS52117077 A JP S52117077A
Authority
JP
Japan
Prior art keywords
electron beam
exposing method
film
picturing
biasedly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3462776A
Other languages
Japanese (ja)
Inventor
Yasuo Furukawa
Seigo Igaki
Noriaki Nakayama
Yushi Inagaki
Masahiro Okabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP3462776A priority Critical patent/JPS52117077A/en
Publication of JPS52117077A publication Critical patent/JPS52117077A/en
Pending legal-status Critical Current

Links

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  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To form a fine pattern on an electronic resist film by performing picturing at a high rate with the aid of an electron beam of small diameter after the film is biasedly exposed to light.
COPYRIGHT: (C)1977,JPO&Japio
JP3462776A 1976-03-29 1976-03-29 Electron beam-exposing method Pending JPS52117077A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3462776A JPS52117077A (en) 1976-03-29 1976-03-29 Electron beam-exposing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3462776A JPS52117077A (en) 1976-03-29 1976-03-29 Electron beam-exposing method

Publications (1)

Publication Number Publication Date
JPS52117077A true JPS52117077A (en) 1977-10-01

Family

ID=12419621

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3462776A Pending JPS52117077A (en) 1976-03-29 1976-03-29 Electron beam-exposing method

Country Status (1)

Country Link
JP (1) JPS52117077A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56164531A (en) * 1980-05-21 1981-12-17 Hitachi Ltd Manufacture of semiconductor
JPS59198720A (en) * 1983-04-26 1984-11-10 Toshiba Corp Electron beam exposure
JPS61202430A (en) * 1985-03-05 1986-09-08 Toshiba Corp Charged beam exposure method
US4712013A (en) * 1984-09-29 1987-12-08 Kabushiki Kaisha Toshiba Method of forming a fine pattern with a charged particle beam

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56164531A (en) * 1980-05-21 1981-12-17 Hitachi Ltd Manufacture of semiconductor
JPS59198720A (en) * 1983-04-26 1984-11-10 Toshiba Corp Electron beam exposure
US4712013A (en) * 1984-09-29 1987-12-08 Kabushiki Kaisha Toshiba Method of forming a fine pattern with a charged particle beam
JPS61202430A (en) * 1985-03-05 1986-09-08 Toshiba Corp Charged beam exposure method

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