JPS52117077A - Electron beam-exposing method - Google Patents
Electron beam-exposing methodInfo
- Publication number
- JPS52117077A JPS52117077A JP3462776A JP3462776A JPS52117077A JP S52117077 A JPS52117077 A JP S52117077A JP 3462776 A JP3462776 A JP 3462776A JP 3462776 A JP3462776 A JP 3462776A JP S52117077 A JPS52117077 A JP S52117077A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- exposing method
- film
- picturing
- biasedly
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To form a fine pattern on an electronic resist film by performing picturing at a high rate with the aid of an electron beam of small diameter after the film is biasedly exposed to light.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3462776A JPS52117077A (en) | 1976-03-29 | 1976-03-29 | Electron beam-exposing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3462776A JPS52117077A (en) | 1976-03-29 | 1976-03-29 | Electron beam-exposing method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52117077A true JPS52117077A (en) | 1977-10-01 |
Family
ID=12419621
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3462776A Pending JPS52117077A (en) | 1976-03-29 | 1976-03-29 | Electron beam-exposing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52117077A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56164531A (en) * | 1980-05-21 | 1981-12-17 | Hitachi Ltd | Manufacture of semiconductor |
JPS59198720A (en) * | 1983-04-26 | 1984-11-10 | Toshiba Corp | Electron beam exposure |
JPS61202430A (en) * | 1985-03-05 | 1986-09-08 | Toshiba Corp | Charged beam exposure method |
US4712013A (en) * | 1984-09-29 | 1987-12-08 | Kabushiki Kaisha Toshiba | Method of forming a fine pattern with a charged particle beam |
-
1976
- 1976-03-29 JP JP3462776A patent/JPS52117077A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56164531A (en) * | 1980-05-21 | 1981-12-17 | Hitachi Ltd | Manufacture of semiconductor |
JPS59198720A (en) * | 1983-04-26 | 1984-11-10 | Toshiba Corp | Electron beam exposure |
US4712013A (en) * | 1984-09-29 | 1987-12-08 | Kabushiki Kaisha Toshiba | Method of forming a fine pattern with a charged particle beam |
JPS61202430A (en) * | 1985-03-05 | 1986-09-08 | Toshiba Corp | Charged beam exposure method |
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