JPS5384478A - Forming method for micropattern - Google Patents
Forming method for micropatternInfo
- Publication number
- JPS5384478A JPS5384478A JP16024876A JP16024876A JPS5384478A JP S5384478 A JPS5384478 A JP S5384478A JP 16024876 A JP16024876 A JP 16024876A JP 16024876 A JP16024876 A JP 16024876A JP S5384478 A JPS5384478 A JP S5384478A
- Authority
- JP
- Japan
- Prior art keywords
- micropattern
- forming method
- irrdiating
- substrate
- layer formed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To obtain a micropattern through an exposure process by irrdiating the proton beam to the prescribed pattern of the resist layer formed on the substrate.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16024876A JPS5384478A (en) | 1976-12-29 | 1976-12-29 | Forming method for micropattern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16024876A JPS5384478A (en) | 1976-12-29 | 1976-12-29 | Forming method for micropattern |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5384478A true JPS5384478A (en) | 1978-07-25 |
Family
ID=15710891
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16024876A Pending JPS5384478A (en) | 1976-12-29 | 1976-12-29 | Forming method for micropattern |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5384478A (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51142276A (en) * | 1975-06-03 | 1976-12-07 | Fujitsu Ltd | Method of exposing photo-resist |
-
1976
- 1976-12-29 JP JP16024876A patent/JPS5384478A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51142276A (en) * | 1975-06-03 | 1976-12-07 | Fujitsu Ltd | Method of exposing photo-resist |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5290269A (en) | Forming method for fine resist patterns | |
JPS5339075A (en) | Step and repeat exposure method of masks | |
JPS52139374A (en) | Alignment pattern forming method for mask alignment | |
JPS5384478A (en) | Forming method for micropattern | |
JPS5421271A (en) | Pattern forming method | |
JPS52117077A (en) | Electron beam-exposing method | |
JPS51148365A (en) | Electron beam exposure method | |
JPS5431282A (en) | Pattern formation method | |
JPS5235980A (en) | Manufacturing method of semiconductor device | |
JPS51139267A (en) | Photo-mask | |
JPS5277671A (en) | Method and equipment of masking | |
JPS5215266A (en) | Pattern printing unit | |
JPS5382173A (en) | Positioning method | |
JPS53105982A (en) | Micropattern formation method | |
JPS5427367A (en) | Manufacture of microwave circuit pattern | |
JPS5244571A (en) | Method of forming fine pattern | |
JPS51147261A (en) | Forming method of pattern | |
JPS52119079A (en) | Electron beam exposure | |
JPS52111382A (en) | Photo-mask producing for semi-conductor | |
JPS5382268A (en) | Production of mask | |
JPS5313880A (en) | Fine patterning method | |
JPS53114676A (en) | Electron beam exposure method | |
JPS52119179A (en) | Electron beam exposing method | |
JPS5381083A (en) | Focusing method of projection exposure apparatus | |
JPS5243444A (en) | Process for fabricating an acoustic hologram |