JPS5427367A - Manufacture of microwave circuit pattern - Google Patents
Manufacture of microwave circuit patternInfo
- Publication number
- JPS5427367A JPS5427367A JP9094877A JP9094877A JPS5427367A JP S5427367 A JPS5427367 A JP S5427367A JP 9094877 A JP9094877 A JP 9094877A JP 9094877 A JP9094877 A JP 9094877A JP S5427367 A JPS5427367 A JP S5427367A
- Authority
- JP
- Japan
- Prior art keywords
- manufacture
- circuit pattern
- microwave circuit
- uneven surface
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To obtain a high-accuracy and high-contrast mask which coincides completely onto the uneven surface substrate, by forming the transcript mask substrate of the solid uneven surface substrate via the resin injected and then removing the metal layer by the parallel photo beam lithography.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9094877A JPS5427367A (en) | 1977-08-03 | 1977-08-03 | Manufacture of microwave circuit pattern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9094877A JPS5427367A (en) | 1977-08-03 | 1977-08-03 | Manufacture of microwave circuit pattern |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5427367A true JPS5427367A (en) | 1979-03-01 |
Family
ID=14012683
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9094877A Pending JPS5427367A (en) | 1977-08-03 | 1977-08-03 | Manufacture of microwave circuit pattern |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5427367A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0476984A (en) * | 1990-07-19 | 1992-03-11 | Polyplastics Co | Manufacture of stereoscopic molded form using stereoscopic conductive circuit on surface |
US20170105287A1 (en) * | 2015-10-12 | 2017-04-13 | Tyco Electronics Corporation | Process of Producing Electronic Component and an Electronic Component |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5191719A (en) * | 1975-02-10 | 1976-08-11 |
-
1977
- 1977-08-03 JP JP9094877A patent/JPS5427367A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5191719A (en) * | 1975-02-10 | 1976-08-11 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0476984A (en) * | 1990-07-19 | 1992-03-11 | Polyplastics Co | Manufacture of stereoscopic molded form using stereoscopic conductive circuit on surface |
US20170105287A1 (en) * | 2015-10-12 | 2017-04-13 | Tyco Electronics Corporation | Process of Producing Electronic Component and an Electronic Component |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0097417A3 (en) | Electron beam lithography | |
JPS5569265A (en) | Pattern-forming method | |
JPS5669835A (en) | Method for forming thin film pattern | |
JPS52119172A (en) | Forming method of fine pattern | |
JPS5427367A (en) | Manufacture of microwave circuit pattern | |
JPS5492061A (en) | Micropattern forming method | |
JPS5421271A (en) | Pattern forming method | |
JPS5580323A (en) | Pattern forming method for photoresist-film | |
JPS5427368A (en) | Manufacture of microwave circuit pattern | |
JPS52117077A (en) | Electron beam-exposing method | |
JPS542685A (en) | Forming method for metal wiring | |
JPS5277671A (en) | Method and equipment of masking | |
JPS5384478A (en) | Forming method for micropattern | |
JPS53113730A (en) | Metallic pattern forming method | |
JPS51147261A (en) | Forming method of pattern | |
JPS563679A (en) | Formation of metallic pattern | |
JPS5496369A (en) | Mask forming method | |
JPS545659A (en) | Manufacture of semiconductor device | |
JPS5558374A (en) | Etching method | |
JPS5339078A (en) | Electron beam exposure method | |
JPS52111382A (en) | Photo-mask producing for semi-conductor | |
JPS53114676A (en) | Electron beam exposure method | |
JPS52119079A (en) | Electron beam exposure | |
JPS52127174A (en) | Minute patern formation method | |
JPS5244571A (en) | Method of forming fine pattern |