JPS53113730A - Metallic pattern forming method - Google Patents

Metallic pattern forming method

Info

Publication number
JPS53113730A
JPS53113730A JP2801277A JP2801277A JPS53113730A JP S53113730 A JPS53113730 A JP S53113730A JP 2801277 A JP2801277 A JP 2801277A JP 2801277 A JP2801277 A JP 2801277A JP S53113730 A JPS53113730 A JP S53113730A
Authority
JP
Japan
Prior art keywords
metallic pattern
forming method
pattern forming
substrate
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2801277A
Other languages
Japanese (ja)
Inventor
Kiyokatsu Jinno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP2801277A priority Critical patent/JPS53113730A/en
Publication of JPS53113730A publication Critical patent/JPS53113730A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To form a desired metallic pattern on a semiconductor substrate by removing desired parts of a tetrafluoroethylene film, by an etching process using a photoresist, formed on the substrate on which various kinds of elements have been formed and then vacuum depositing a metal.
COPYRIGHT: (C)1978,JPO&Japio
JP2801277A 1977-03-16 1977-03-16 Metallic pattern forming method Pending JPS53113730A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2801277A JPS53113730A (en) 1977-03-16 1977-03-16 Metallic pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2801277A JPS53113730A (en) 1977-03-16 1977-03-16 Metallic pattern forming method

Publications (1)

Publication Number Publication Date
JPS53113730A true JPS53113730A (en) 1978-10-04

Family

ID=12236856

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2801277A Pending JPS53113730A (en) 1977-03-16 1977-03-16 Metallic pattern forming method

Country Status (1)

Country Link
JP (1) JPS53113730A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5212666A (en) * 1989-07-10 1993-05-18 Seiko Epson Corporation Memory apparatus having flexibly designed memory capacity
US5824603A (en) * 1993-11-05 1998-10-20 Texas Instruments Incorporated Method of forming a low-K layer in an integrated circuit
WO2000076008A1 (en) * 1999-06-09 2000-12-14 Cambridge Display Technology Limited Method of producing organic light-emissive devices

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5212666A (en) * 1989-07-10 1993-05-18 Seiko Epson Corporation Memory apparatus having flexibly designed memory capacity
US5824603A (en) * 1993-11-05 1998-10-20 Texas Instruments Incorporated Method of forming a low-K layer in an integrated circuit
US6069084A (en) * 1993-11-05 2000-05-30 Texas Instruments Incorporated Method of forming a low-k layer in an Integrated circuit
WO2000076008A1 (en) * 1999-06-09 2000-12-14 Cambridge Display Technology Limited Method of producing organic light-emissive devices
GB2367692A (en) * 1999-06-09 2002-04-10 Cambridge Display Tech Ltd Method of producing organic light-emissive devices
US6878297B1 (en) 1999-06-09 2005-04-12 Cambridge Display Technology, Limited Method of producing organic light-emissive devices

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