JPS558013A - Semiconductor device manufacturing method - Google Patents
Semiconductor device manufacturing methodInfo
- Publication number
- JPS558013A JPS558013A JP7940478A JP7940478A JPS558013A JP S558013 A JPS558013 A JP S558013A JP 7940478 A JP7940478 A JP 7940478A JP 7940478 A JP7940478 A JP 7940478A JP S558013 A JPS558013 A JP S558013A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- photo
- insoluble
- film
- resists
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To simplify resist-manufacturing process by using resists of the same kind in multiple layers in such a manner as to turn a photo-resist into insoluble to an exclusive developer at a given time and also make it insoluble to a resist itself.
CONSTITUTION: If 1-hyroxyl and 2-alkylimidazolin are solved in a positive type photo-resist, the resist becomes almost insoluble to a developer if it is heated to approximately 120°C or more. If the photo-resist film is exposed to an inert gas plasma for several minutes, even if another coating of photo-resist was applied onto the film, it (the bottom resist film) is not solved. By utilizing these phenomena, it is possible to use positive type photo-resists in multiple layers and also to simplify the manufacturing process.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7940478A JPS558013A (en) | 1978-06-30 | 1978-06-30 | Semiconductor device manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7940478A JPS558013A (en) | 1978-06-30 | 1978-06-30 | Semiconductor device manufacturing method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS558013A true JPS558013A (en) | 1980-01-21 |
Family
ID=13688910
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7940478A Pending JPS558013A (en) | 1978-06-30 | 1978-06-30 | Semiconductor device manufacturing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS558013A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57112023A (en) * | 1980-12-29 | 1982-07-12 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS59228648A (en) * | 1983-06-10 | 1984-12-22 | Sumitomo Electric Ind Ltd | Method for developing photoresist |
EP2989138B1 (en) | 2013-04-22 | 2018-08-01 | Perstorp Ab | Urethane acrylates based on 2,4,8,10-tetraoxospiro[5.5]undecane-3,9-dialkanols |
-
1978
- 1978-06-30 JP JP7940478A patent/JPS558013A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57112023A (en) * | 1980-12-29 | 1982-07-12 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS59228648A (en) * | 1983-06-10 | 1984-12-22 | Sumitomo Electric Ind Ltd | Method for developing photoresist |
EP2989138B1 (en) | 2013-04-22 | 2018-08-01 | Perstorp Ab | Urethane acrylates based on 2,4,8,10-tetraoxospiro[5.5]undecane-3,9-dialkanols |
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