JPS533821A - Exposure method - Google Patents
Exposure methodInfo
- Publication number
- JPS533821A JPS533821A JP7867776A JP7867776A JPS533821A JP S533821 A JPS533821 A JP S533821A JP 7867776 A JP7867776 A JP 7867776A JP 7867776 A JP7867776 A JP 7867776A JP S533821 A JPS533821 A JP S533821A
- Authority
- JP
- Japan
- Prior art keywords
- exposure method
- light
- negative resist
- accuracey
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To remove a detect deteriorating the accuracey of a pattern exposed to light in fitting electrodes or the like on a wafer, by exposing a negative resist to light after formation of a reflection preventing film on the negative resist.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7867776A JPS533821A (en) | 1976-07-01 | 1976-07-01 | Exposure method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7867776A JPS533821A (en) | 1976-07-01 | 1976-07-01 | Exposure method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS533821A true JPS533821A (en) | 1978-01-13 |
Family
ID=13668492
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7867776A Pending JPS533821A (en) | 1976-07-01 | 1976-07-01 | Exposure method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS533821A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6038821A (en) * | 1983-08-12 | 1985-02-28 | Hitachi Ltd | Pattern forming method |
-
1976
- 1976-07-01 JP JP7867776A patent/JPS533821A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6038821A (en) * | 1983-08-12 | 1985-02-28 | Hitachi Ltd | Pattern forming method |
JPH0455323B2 (en) * | 1983-08-12 | 1992-09-03 | Hitachi Ltd |
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