JPS5413269A - Forming method of two layer protective film - Google Patents
Forming method of two layer protective filmInfo
- Publication number
- JPS5413269A JPS5413269A JP7793177A JP7793177A JPS5413269A JP S5413269 A JPS5413269 A JP S5413269A JP 7793177 A JP7793177 A JP 7793177A JP 7793177 A JP7793177 A JP 7793177A JP S5413269 A JPS5413269 A JP S5413269A
- Authority
- JP
- Japan
- Prior art keywords
- protective film
- forming method
- layer protective
- photo resist
- tupe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
- Weting (AREA)
- Formation Of Insulating Films (AREA)
Abstract
PURPOSE: To form the protective film of two layer constitution by one processing, by removing the positive type photo resist through taking the negative tupe photo resist as a mask.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7793177A JPS5413269A (en) | 1977-07-01 | 1977-07-01 | Forming method of two layer protective film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7793177A JPS5413269A (en) | 1977-07-01 | 1977-07-01 | Forming method of two layer protective film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5413269A true JPS5413269A (en) | 1979-01-31 |
Family
ID=13647819
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7793177A Pending JPS5413269A (en) | 1977-07-01 | 1977-07-01 | Forming method of two layer protective film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5413269A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5173437A (en) * | 1991-08-01 | 1992-12-22 | Chartered Semiconductor Manufacturing Pte Ltd | Double polysilicon capacitor formation compatable with submicron processing |
-
1977
- 1977-07-01 JP JP7793177A patent/JPS5413269A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5173437A (en) * | 1991-08-01 | 1992-12-22 | Chartered Semiconductor Manufacturing Pte Ltd | Double polysilicon capacitor formation compatable with submicron processing |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5228875A (en) | Mask | |
JPS5394770A (en) | Photo mask | |
JPS5413269A (en) | Forming method of two layer protective film | |
JPS5389673A (en) | Fine pattern forming method of semiconductor device | |
JPS5373073A (en) | Treatment method for photo resist | |
JPS51126073A (en) | Pattern printing equpment made available by photo-etching method | |
JPS52143772A (en) | Alignment method of masks using special reference marks | |
JPS5421273A (en) | Manufacture for photo mask | |
JPS52143769A (en) | Removing method of positive type photo resist | |
JPS525270A (en) | Photo-mask | |
JPS5429975A (en) | Photo mask | |
JPS5399772A (en) | Optical mask | |
JPS5314570A (en) | Production of photo mask | |
JPS548978A (en) | Manufacture of photto mask | |
JPS52152171A (en) | Wafer alignment method | |
JPS5259574A (en) | Production of lead frame for ic | |
JPS52156569A (en) | Production of optical mask | |
JPS5429987A (en) | Forming method of selective vapor-deposition film | |
JPS53126879A (en) | Formation mathod of electrode wiring layer | |
JPS5382271A (en) | Photo mask | |
JPS53127082A (en) | Method of packaging | |
JPS522532A (en) | Photosensitive composite for electro photography | |
JPS5397374A (en) | Mask producing method | |
JPS5431281A (en) | Optical exposure mask | |
JPS533821A (en) | Exposure method |