JPS5429987A - Forming method of selective vapor-deposition film - Google Patents

Forming method of selective vapor-deposition film

Info

Publication number
JPS5429987A
JPS5429987A JP9508477A JP9508477A JPS5429987A JP S5429987 A JPS5429987 A JP S5429987A JP 9508477 A JP9508477 A JP 9508477A JP 9508477 A JP9508477 A JP 9508477A JP S5429987 A JPS5429987 A JP S5429987A
Authority
JP
Japan
Prior art keywords
deposition film
forming method
selective vapor
vapor
selective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9508477A
Other languages
Japanese (ja)
Inventor
Manabu Matsuzawa
Takeshi Uryu
Yoshio Nonaka
Kohei Yamada
Koichiro Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9508477A priority Critical patent/JPS5429987A/en
Publication of JPS5429987A publication Critical patent/JPS5429987A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To form selectively a vapor-deposition film by side-etching a spacer between a photo resist and substrate.
COPYRIGHT: (C)1979,JPO&Japio
JP9508477A 1977-08-10 1977-08-10 Forming method of selective vapor-deposition film Pending JPS5429987A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9508477A JPS5429987A (en) 1977-08-10 1977-08-10 Forming method of selective vapor-deposition film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9508477A JPS5429987A (en) 1977-08-10 1977-08-10 Forming method of selective vapor-deposition film

Publications (1)

Publication Number Publication Date
JPS5429987A true JPS5429987A (en) 1979-03-06

Family

ID=14128065

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9508477A Pending JPS5429987A (en) 1977-08-10 1977-08-10 Forming method of selective vapor-deposition film

Country Status (1)

Country Link
JP (1) JPS5429987A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60251627A (en) * 1984-05-28 1985-12-12 Rohm Co Ltd Manufacture of semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60251627A (en) * 1984-05-28 1985-12-12 Rohm Co Ltd Manufacture of semiconductor device

Similar Documents

Publication Publication Date Title
JPS5429987A (en) Forming method of selective vapor-deposition film
JPS5230170A (en) Method of photoetching
JPS5313423A (en) Photosensitive element of selenium for electronic photography
JPS5387668A (en) Forming method of patterns
JPS5389673A (en) Fine pattern forming method of semiconductor device
JPS53127266A (en) Forming method of marker
JPS5321574A (en) Contact and separation method of photo mask
JPS5373073A (en) Treatment method for photo resist
JPS52143772A (en) Alignment method of masks using special reference marks
JPS525270A (en) Photo-mask
JPS5314570A (en) Production of photo mask
JPS53105982A (en) Micropattern formation method
JPS5261475A (en) Production of silicon crystal film
JPS52147593A (en) Production of compound thin film
JPS5380994A (en) Lift-off method
JPS52127174A (en) Minute patern formation method
JPS5212593A (en) Production method of shot key barrier type solid element
JPS545659A (en) Manufacture of semiconductor device
JPS5385168A (en) Photoetching method
JPS53107274A (en) Forming method of patterns
JPS5429975A (en) Photo mask
JPS5397374A (en) Mask producing method
JPS5413269A (en) Forming method of two layer protective film
JPS5327368A (en) Selective etching method
JPS52127768A (en) Spatter etching method