JPS52127768A - Spatter etching method - Google Patents

Spatter etching method

Info

Publication number
JPS52127768A
JPS52127768A JP4461376A JP4461376A JPS52127768A JP S52127768 A JPS52127768 A JP S52127768A JP 4461376 A JP4461376 A JP 4461376A JP 4461376 A JP4461376 A JP 4461376A JP S52127768 A JPS52127768 A JP S52127768A
Authority
JP
Japan
Prior art keywords
etching method
spatter etching
spatter
abosrbing
substane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4461376A
Other languages
Japanese (ja)
Other versions
JPS5946094B2 (en
Inventor
Masanao Itoga
Junji Sato
Toshiro Ichikawa
Minoru Inoue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP4461376A priority Critical patent/JPS5946094B2/en
Publication of JPS52127768A publication Critical patent/JPS52127768A/en
Publication of JPS5946094B2 publication Critical patent/JPS5946094B2/en
Expired legal-status Critical Current

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  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To make the ratio of the etched speed of SiO2 to Si large by forming MoF3, arranging the substane abosrbing F such as Mo, etc., close by the Si basic plate, and making the spatter etching.
COPYRIGHT: (C)1977,JPO&Japio
JP4461376A 1976-04-19 1976-04-19 Sputter etching method Expired JPS5946094B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4461376A JPS5946094B2 (en) 1976-04-19 1976-04-19 Sputter etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4461376A JPS5946094B2 (en) 1976-04-19 1976-04-19 Sputter etching method

Publications (2)

Publication Number Publication Date
JPS52127768A true JPS52127768A (en) 1977-10-26
JPS5946094B2 JPS5946094B2 (en) 1984-11-10

Family

ID=12696283

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4461376A Expired JPS5946094B2 (en) 1976-04-19 1976-04-19 Sputter etching method

Country Status (1)

Country Link
JP (1) JPS5946094B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111617744A (en) * 2020-06-09 2020-09-04 周建文 Fe-MOFs-based magnetic porous carbon adsorption material and preparation method thereof

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01113497U (en) * 1988-01-26 1989-07-31

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111617744A (en) * 2020-06-09 2020-09-04 周建文 Fe-MOFs-based magnetic porous carbon adsorption material and preparation method thereof

Also Published As

Publication number Publication date
JPS5946094B2 (en) 1984-11-10

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