JPS5219070A - Distribution method - Google Patents
Distribution methodInfo
- Publication number
- JPS5219070A JPS5219070A JP9515575A JP9515575A JPS5219070A JP S5219070 A JPS5219070 A JP S5219070A JP 9515575 A JP9515575 A JP 9515575A JP 9515575 A JP9515575 A JP 9515575A JP S5219070 A JPS5219070 A JP S5219070A
- Authority
- JP
- Japan
- Prior art keywords
- distribution method
- etching
- spacer
- reducing
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
PURPOSE: A distribution method which makes the ultra fine aluminum patterning possible by means of reducing the side etching quantity thereby performing the etching of spacer-layer.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9515575A JPS5219070A (en) | 1975-08-05 | 1975-08-05 | Distribution method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9515575A JPS5219070A (en) | 1975-08-05 | 1975-08-05 | Distribution method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5219070A true JPS5219070A (en) | 1977-01-14 |
Family
ID=14129887
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9515575A Pending JPS5219070A (en) | 1975-08-05 | 1975-08-05 | Distribution method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5219070A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55125627A (en) * | 1979-03-22 | 1980-09-27 | Hitachi Ltd | Formation of electrode for semiconductor device |
JPS55134932A (en) * | 1979-04-10 | 1980-10-21 | Toshiba Corp | Preparation of semiconductor device |
JPS56105632A (en) * | 1980-01-28 | 1981-08-22 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
JPS57169258A (en) * | 1981-04-10 | 1982-10-18 | Oki Electric Ind Co Ltd | Manufacture of semiconductor device |
-
1975
- 1975-08-05 JP JP9515575A patent/JPS5219070A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55125627A (en) * | 1979-03-22 | 1980-09-27 | Hitachi Ltd | Formation of electrode for semiconductor device |
JPS55134932A (en) * | 1979-04-10 | 1980-10-21 | Toshiba Corp | Preparation of semiconductor device |
JPS56105632A (en) * | 1980-01-28 | 1981-08-22 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
JPS57169258A (en) * | 1981-04-10 | 1982-10-18 | Oki Electric Ind Co Ltd | Manufacture of semiconductor device |
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