JPS5394770A - Photo mask - Google Patents

Photo mask

Info

Publication number
JPS5394770A
JPS5394770A JP865677A JP865677A JPS5394770A JP S5394770 A JPS5394770 A JP S5394770A JP 865677 A JP865677 A JP 865677A JP 865677 A JP865677 A JP 865677A JP S5394770 A JPS5394770 A JP S5394770A
Authority
JP
Japan
Prior art keywords
photo mask
photo
resist film
photo resist
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP865677A
Other languages
Japanese (ja)
Other versions
JPS5411668B2 (en
Inventor
Toshiharu Matsuzawa
Hiroshi Yanagisawa
Tetsukazu Hashimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP865677A priority Critical patent/JPS5411668B2/ja
Publication of JPS5394770A publication Critical patent/JPS5394770A/en
Publication of JPS5411668B2 publication Critical patent/JPS5411668B2/ja
Expired legal-status Critical Current

Links

Abstract

PURPOSE: To make the separation from the photo resist film easy and to obtain the photo mask which can be used several times repeatedly, by adhering the SiO2 film which has surface free energy reduce through surface process onto the surface to be made in contact with the photo resist film of the photo mask.
COPYRIGHT: (C)1978,JPO&Japio
JP865677A 1977-01-31 1977-01-31 Expired JPS5411668B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP865677A JPS5411668B2 (en) 1977-01-31 1977-01-31

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP865677A JPS5411668B2 (en) 1977-01-31 1977-01-31

Publications (2)

Publication Number Publication Date
JPS5394770A true JPS5394770A (en) 1978-08-19
JPS5411668B2 JPS5411668B2 (en) 1979-05-16

Family

ID=11698966

Family Applications (1)

Application Number Title Priority Date Filing Date
JP865677A Expired JPS5411668B2 (en) 1977-01-31 1977-01-31

Country Status (1)

Country Link
JP (1) JPS5411668B2 (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4499162A (en) * 1983-06-24 1985-02-12 At&T Technologies, Inc. Photomask and method of using same
US4537813A (en) * 1982-09-27 1985-08-27 At&T Technologies, Inc. Photomask encapsulation
US4560639A (en) * 1980-05-08 1985-12-24 Sullivan Donald F Reusable phototransparency image forming tools for direct contact printing
US5079113A (en) * 1988-09-29 1992-01-07 Sharp Kabushiki Kaisha Photo-mask
JPH05181259A (en) * 1991-09-05 1993-07-23 Mitsubishi Electric Corp Photomask and production thereof
US5260150A (en) * 1987-09-30 1993-11-09 Sharp Kabushiki Kaisha Photo-mask with light shielding film buried in substrate
US6565704B2 (en) * 1998-07-08 2003-05-20 Nitto Denko Corporation Process for the removal of resist material
JP2008032941A (en) * 2006-07-27 2008-02-14 Kuraray Co Ltd Gradation mask and method for manufacturing the same

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS501787A (en) * 1973-05-04 1975-01-09
JPS5019209A (en) * 1971-11-23 1975-02-28

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5019209A (en) * 1971-11-23 1975-02-28
JPS501787A (en) * 1973-05-04 1975-01-09

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4560639A (en) * 1980-05-08 1985-12-24 Sullivan Donald F Reusable phototransparency image forming tools for direct contact printing
US4537813A (en) * 1982-09-27 1985-08-27 At&T Technologies, Inc. Photomask encapsulation
US4499162A (en) * 1983-06-24 1985-02-12 At&T Technologies, Inc. Photomask and method of using same
US5260150A (en) * 1987-09-30 1993-11-09 Sharp Kabushiki Kaisha Photo-mask with light shielding film buried in substrate
US5079113A (en) * 1988-09-29 1992-01-07 Sharp Kabushiki Kaisha Photo-mask
JPH05181259A (en) * 1991-09-05 1993-07-23 Mitsubishi Electric Corp Photomask and production thereof
US6565704B2 (en) * 1998-07-08 2003-05-20 Nitto Denko Corporation Process for the removal of resist material
JP2008032941A (en) * 2006-07-27 2008-02-14 Kuraray Co Ltd Gradation mask and method for manufacturing the same

Also Published As

Publication number Publication date
JPS5411668B2 (en) 1979-05-16

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