JPS5421273A - Manufacture for photo mask - Google Patents
Manufacture for photo maskInfo
- Publication number
- JPS5421273A JPS5421273A JP8683177A JP8683177A JPS5421273A JP S5421273 A JPS5421273 A JP S5421273A JP 8683177 A JP8683177 A JP 8683177A JP 8683177 A JP8683177 A JP 8683177A JP S5421273 A JPS5421273 A JP S5421273A
- Authority
- JP
- Japan
- Prior art keywords
- photo mask
- film
- manufacture
- reflection
- photo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE: To establish a photo mask with excellent dimension accuracy, by using a Si3N4 film as the reflection prevention film, in forming photo shield film and reflection film on a transparent substrate with lamination.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8683177A JPS5421273A (en) | 1977-07-19 | 1977-07-19 | Manufacture for photo mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8683177A JPS5421273A (en) | 1977-07-19 | 1977-07-19 | Manufacture for photo mask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5421273A true JPS5421273A (en) | 1979-02-17 |
Family
ID=13897749
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8683177A Pending JPS5421273A (en) | 1977-07-19 | 1977-07-19 | Manufacture for photo mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5421273A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5831336A (en) * | 1981-08-19 | 1983-02-24 | Konishiroku Photo Ind Co Ltd | Raw material of photomask |
JPS61138257A (en) * | 1984-12-10 | 1986-06-25 | Toshiba Corp | Mask substrate |
JPS61138256A (en) * | 1984-12-10 | 1986-06-25 | Toshiba Corp | Formation of mask pattern |
JPS61235819A (en) * | 1985-04-12 | 1986-10-21 | Hitachi Ltd | Liquid crystal display element |
-
1977
- 1977-07-19 JP JP8683177A patent/JPS5421273A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5831336A (en) * | 1981-08-19 | 1983-02-24 | Konishiroku Photo Ind Co Ltd | Raw material of photomask |
JPS61138257A (en) * | 1984-12-10 | 1986-06-25 | Toshiba Corp | Mask substrate |
JPS61138256A (en) * | 1984-12-10 | 1986-06-25 | Toshiba Corp | Formation of mask pattern |
JPS6339893B2 (en) * | 1984-12-10 | 1988-08-08 | Tokyo Shibaura Electric Co | |
JPS6339892B2 (en) * | 1984-12-10 | 1988-08-08 | Tokyo Shibaura Electric Co | |
JPS61235819A (en) * | 1985-04-12 | 1986-10-21 | Hitachi Ltd | Liquid crystal display element |
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