JPS51111075A - Photo etching photo mask - Google Patents
Photo etching photo maskInfo
- Publication number
- JPS51111075A JPS51111075A JP3708075A JP3708075A JPS51111075A JP S51111075 A JPS51111075 A JP S51111075A JP 3708075 A JP3708075 A JP 3708075A JP 3708075 A JP3708075 A JP 3708075A JP S51111075 A JPS51111075 A JP S51111075A
- Authority
- JP
- Japan
- Prior art keywords
- photo
- mask
- etching
- photo mask
- high durability
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE: A photo mask with high durability and low reflection properties compared with the hard mask up to now available.
COPYRIGHT: (C)1976,JPO&Japio
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50037080A JPS5829619B2 (en) | 1975-03-26 | 1975-03-26 | Shashin Yotsukokuyo Photomask |
US05/613,427 US4068018A (en) | 1974-09-19 | 1975-09-15 | Process for preparing a mask for use in manufacturing a semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50037080A JPS5829619B2 (en) | 1975-03-26 | 1975-03-26 | Shashin Yotsukokuyo Photomask |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS51111075A true JPS51111075A (en) | 1976-10-01 |
JPS5829619B2 JPS5829619B2 (en) | 1983-06-23 |
Family
ID=12487560
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50037080A Expired JPS5829619B2 (en) | 1974-09-19 | 1975-03-26 | Shashin Yotsukokuyo Photomask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5829619B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55127557A (en) * | 1979-03-24 | 1980-10-02 | Sanyo Electric Co Ltd | Photomask and production thereof |
JPS5652751A (en) * | 1979-10-05 | 1981-05-12 | Dainippon Printing Co Ltd | Photomask correcting method |
WO1989001650A1 (en) * | 1987-08-10 | 1989-02-23 | Idemitsu Petrochemical Company Limited | Durable patterning member |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63165312U (en) * | 1987-04-17 | 1988-10-27 |
-
1975
- 1975-03-26 JP JP50037080A patent/JPS5829619B2/en not_active Expired
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55127557A (en) * | 1979-03-24 | 1980-10-02 | Sanyo Electric Co Ltd | Photomask and production thereof |
JPS5652751A (en) * | 1979-10-05 | 1981-05-12 | Dainippon Printing Co Ltd | Photomask correcting method |
JPS6159506B2 (en) * | 1979-10-05 | 1986-12-16 | Dainippon Printing Co Ltd | |
WO1989001650A1 (en) * | 1987-08-10 | 1989-02-23 | Idemitsu Petrochemical Company Limited | Durable patterning member |
US5051295A (en) * | 1987-08-10 | 1991-09-24 | Idemitsu Petrochemical Company Limited | Protective film for photo masks and lith films |
Also Published As
Publication number | Publication date |
---|---|
JPS5829619B2 (en) | 1983-06-23 |
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