JPS55127557A - Photomask and production thereof - Google Patents

Photomask and production thereof

Info

Publication number
JPS55127557A
JPS55127557A JP3473179A JP3473179A JPS55127557A JP S55127557 A JPS55127557 A JP S55127557A JP 3473179 A JP3473179 A JP 3473179A JP 3473179 A JP3473179 A JP 3473179A JP S55127557 A JPS55127557 A JP S55127557A
Authority
JP
Japan
Prior art keywords
photomask
film
produce
pattern
resist film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3473179A
Other languages
Japanese (ja)
Inventor
Hisashi Fukuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP3473179A priority Critical patent/JPS55127557A/en
Publication of JPS55127557A publication Critical patent/JPS55127557A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To produce a high accuracy photomask for manufacturing a semiconductor device while omitting an etching transfer process by blackening a desired pattern, with fluorinated plasma, obtained from a resist film formed on a transparent substrate. CONSTITUTION:A high molecular photosensitive resin such as polymethyl methacrylate is coated onto glass substrate 1 and baked to form resist film 2. After irradiating the desired resion of film 2 with electron beam 3 film 2 is developed by dipping in a developer such as a mixed solution of ethyl acetate and isoamyl acetate to obtain a desired pattern. This pattern is then exposed to fluorinated plasma 5 in a known plasma etching device, thus being blackened and hardened to produce a photomask.
JP3473179A 1979-03-24 1979-03-24 Photomask and production thereof Pending JPS55127557A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3473179A JPS55127557A (en) 1979-03-24 1979-03-24 Photomask and production thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3473179A JPS55127557A (en) 1979-03-24 1979-03-24 Photomask and production thereof

Publications (1)

Publication Number Publication Date
JPS55127557A true JPS55127557A (en) 1980-10-02

Family

ID=12422450

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3473179A Pending JPS55127557A (en) 1979-03-24 1979-03-24 Photomask and production thereof

Country Status (1)

Country Link
JP (1) JPS55127557A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5136873A (en) * 1974-09-19 1976-03-27 Nippon Electric Co
JPS51111075A (en) * 1975-03-26 1976-10-01 Nec Corp Photo etching photo mask

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5136873A (en) * 1974-09-19 1976-03-27 Nippon Electric Co
JPS51111075A (en) * 1975-03-26 1976-10-01 Nec Corp Photo etching photo mask

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