JPS55147631A - Mask base material - Google Patents

Mask base material

Info

Publication number
JPS55147631A
JPS55147631A JP5647279A JP5647279A JPS55147631A JP S55147631 A JPS55147631 A JP S55147631A JP 5647279 A JP5647279 A JP 5647279A JP 5647279 A JP5647279 A JP 5647279A JP S55147631 A JPS55147631 A JP S55147631A
Authority
JP
Japan
Prior art keywords
pattern
layer
base material
mask base
hydride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5647279A
Other languages
Japanese (ja)
Inventor
Katsuhiro Kawabuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP5647279A priority Critical patent/JPS55147631A/en
Publication of JPS55147631A publication Critical patent/JPS55147631A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To provide high quality to a mask base material for a photomask used in manufacture of LSI, etc. by using an Si or Ge layer or an Si-Ge mixed layer, as the shielding layer of the material, to which a III or V group element in the periodic table has been added. CONSTITUTION:When transparent substrate 21 is covered with Si-Ge layer 22 as a shielding layer, hydride of a III or V group element such as B or Ga is fed together with silicon hydride and germanium hydride using H2 gas as carrier to form mask base material 22 on glass substrate 21. After coating layer 22 with resist film 24 made of polymethyl methacrylate or the like a pattern is drawn with electron beams and developed to form resist pattern 25. Exposed film 22 is then etched selectively by reactive sputtering technique to form mask pattern 26, thus manufacturing photomask 27. This pattern is of high accuracy and free from pattern deformation due to electric charging in the electron beam drawing.
JP5647279A 1979-05-09 1979-05-09 Mask base material Pending JPS55147631A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5647279A JPS55147631A (en) 1979-05-09 1979-05-09 Mask base material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5647279A JPS55147631A (en) 1979-05-09 1979-05-09 Mask base material

Publications (1)

Publication Number Publication Date
JPS55147631A true JPS55147631A (en) 1980-11-17

Family

ID=13028039

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5647279A Pending JPS55147631A (en) 1979-05-09 1979-05-09 Mask base material

Country Status (1)

Country Link
JP (1) JPS55147631A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5928156A (en) * 1982-12-29 1984-02-14 Konishiroku Photo Ind Co Ltd Manufacture of exposure mask

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5928156A (en) * 1982-12-29 1984-02-14 Konishiroku Photo Ind Co Ltd Manufacture of exposure mask
JPH0548464B2 (en) * 1982-12-29 1993-07-21 Konishiroku Photo Ind

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