JPS5794750A - Formation of micropattern - Google Patents

Formation of micropattern

Info

Publication number
JPS5794750A
JPS5794750A JP17126480A JP17126480A JPS5794750A JP S5794750 A JPS5794750 A JP S5794750A JP 17126480 A JP17126480 A JP 17126480A JP 17126480 A JP17126480 A JP 17126480A JP S5794750 A JPS5794750 A JP S5794750A
Authority
JP
Japan
Prior art keywords
substrate
photoresist
layer
several
micropattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17126480A
Other languages
Japanese (ja)
Inventor
Hiromichi Kono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP17126480A priority Critical patent/JPS5794750A/en
Publication of JPS5794750A publication Critical patent/JPS5794750A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Drying Of Semiconductors (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To accurately form a micropattern in a high yield by coating a substrate with a photosensitive film, imagewise exposing the substrate, and exposing it to plasma contg. oxygen. CONSTITUTION:A film 2 such as a silicon oxide film is formed on a substrate 1, and it is coated with a photoresist 3. The substrate is selectively irradiated with ultraviolet light through a photomask. Thus, the photoresist is separated into an exposed part 3b and an unexposed part 3a. By carrying out said processes in an atmosphere contg. nitrogen, a thin reaction product layer 3c soluble slightly in a developer and having several 100-several 1,000Angstrom thickness is formed on the surface of the photoresist layer. The whole substrate is then exposed to oxygen plasma with 200W RF power for 10min to remove the layer 3c, and development is carried out.
JP17126480A 1980-12-04 1980-12-04 Formation of micropattern Pending JPS5794750A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17126480A JPS5794750A (en) 1980-12-04 1980-12-04 Formation of micropattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17126480A JPS5794750A (en) 1980-12-04 1980-12-04 Formation of micropattern

Publications (1)

Publication Number Publication Date
JPS5794750A true JPS5794750A (en) 1982-06-12

Family

ID=15920097

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17126480A Pending JPS5794750A (en) 1980-12-04 1980-12-04 Formation of micropattern

Country Status (1)

Country Link
JP (1) JPS5794750A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61229103A (en) * 1985-04-04 1986-10-13 Canon Inc Controller of copying machine or the like

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61229103A (en) * 1985-04-04 1986-10-13 Canon Inc Controller of copying machine or the like

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