JPS5742043A - Photosensitive material - Google Patents

Photosensitive material

Info

Publication number
JPS5742043A
JPS5742043A JP11892580A JP11892580A JPS5742043A JP S5742043 A JPS5742043 A JP S5742043A JP 11892580 A JP11892580 A JP 11892580A JP 11892580 A JP11892580 A JP 11892580A JP S5742043 A JPS5742043 A JP S5742043A
Authority
JP
Japan
Prior art keywords
layer
photosensitive layer
negative
photosensitive
anaerobic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11892580A
Other languages
Japanese (ja)
Inventor
Muneo Hatta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP11892580A priority Critical patent/JPS5742043A/en
Publication of JPS5742043A publication Critical patent/JPS5742043A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To obtain a fine micropattern by contact exposure by forming a negative or positive type aerobic photosensitive layer on a negative or positive type anaerobic thick photosensitive layer and using the resulting material after removing a peelable protective film adhered to the other side of the anaerobic layer. CONSTITUTION:For example, on one side of a negative type anaerobic thick photosensitive layer 10 a negative type aerobic photosensitive layer 11 is formed, and on the other side a peelable protective thin film 12 is laid to manufacture a photosensitive material 9. When the material 9 is used, the film 12 is removed, the layer 10 is mounted on a substrate 16, and after bringing a photomask 14 having a pattern 15 into contact with the layer 11, the material 9 is exposed to a light source 13. The layer 11, 10 are then developed in succession to obtain a photosensitive layer pattern. Since direct contact exposure is performed unlike a conventional method carrying out exposure through a transparent protective layer and removing the layer, a micropattern of high accuracy is obtd.
JP11892580A 1980-08-27 1980-08-27 Photosensitive material Pending JPS5742043A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11892580A JPS5742043A (en) 1980-08-27 1980-08-27 Photosensitive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11892580A JPS5742043A (en) 1980-08-27 1980-08-27 Photosensitive material

Publications (1)

Publication Number Publication Date
JPS5742043A true JPS5742043A (en) 1982-03-09

Family

ID=14748586

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11892580A Pending JPS5742043A (en) 1980-08-27 1980-08-27 Photosensitive material

Country Status (1)

Country Link
JP (1) JPS5742043A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62183119A (en) * 1986-02-06 1987-08-11 Nec Corp X-ray exposure method
JPH02230149A (en) * 1987-12-16 1990-09-12 Nippon Synthetic Chem Ind Co Ltd:The Image forming method
US4980483A (en) * 1988-03-25 1990-12-25 Nippon Shokubai Kagaku Kogyo Co., Ltd. Method for production of maleimides
WO2010018926A2 (en) 2008-08-11 2010-02-18 금호석유화학 주식회사 Method for preparing n-substituted maleimides

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62183119A (en) * 1986-02-06 1987-08-11 Nec Corp X-ray exposure method
JPH02230149A (en) * 1987-12-16 1990-09-12 Nippon Synthetic Chem Ind Co Ltd:The Image forming method
US4980483A (en) * 1988-03-25 1990-12-25 Nippon Shokubai Kagaku Kogyo Co., Ltd. Method for production of maleimides
WO2010018926A2 (en) 2008-08-11 2010-02-18 금호석유화학 주식회사 Method for preparing n-substituted maleimides
US8283477B2 (en) 2008-08-11 2012-10-09 Korea Kumho Petrochemical Co., Ltd. Method for preparing N-substituted maleimides

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