JPS57212445A - Production of photomask - Google Patents

Production of photomask

Info

Publication number
JPS57212445A
JPS57212445A JP9780281A JP9780281A JPS57212445A JP S57212445 A JPS57212445 A JP S57212445A JP 9780281 A JP9780281 A JP 9780281A JP 9780281 A JP9780281 A JP 9780281A JP S57212445 A JPS57212445 A JP S57212445A
Authority
JP
Japan
Prior art keywords
film
pattern
substrate
photomask
light shielding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9780281A
Other languages
Japanese (ja)
Inventor
Eiji Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9780281A priority Critical patent/JPS57212445A/en
Publication of JPS57212445A publication Critical patent/JPS57212445A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To produce a photomask containing a high-accuracy light shielding pattern in an easy and stable way, by forming first a resin pattern by exposing an image to light at the side of a glass substrate when the photomask is produced by a lift-off process. CONSTITUTION:A positive photosensitive resin film 12' is formed on a single surface of a glass mask substrate 11, and the pattern exposure 13 is carried out at the side of the substrate 11. The film 12' is developed to form a positive photosensitive resin pattern 12 on the substrate 11. Then a light shielding material film 14' is formed, and the light shielding film material on the pattern 12 is removed together with the film 12'. The film 14' on the substrate 11 is separated from the film 14' on the resist pattern 12. As a result, no loss is caused to the film 14 due to the lift-off process. Thus a photomask of high accuracy can be produced in an easy and stable way.
JP9780281A 1981-06-24 1981-06-24 Production of photomask Pending JPS57212445A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9780281A JPS57212445A (en) 1981-06-24 1981-06-24 Production of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9780281A JPS57212445A (en) 1981-06-24 1981-06-24 Production of photomask

Publications (1)

Publication Number Publication Date
JPS57212445A true JPS57212445A (en) 1982-12-27

Family

ID=14201908

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9780281A Pending JPS57212445A (en) 1981-06-24 1981-06-24 Production of photomask

Country Status (1)

Country Link
JP (1) JPS57212445A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005045911A1 (en) * 2003-11-11 2005-05-19 Asahi Glass Company, Limited Pattern formation method, electronic circuit manufactured by the same, and electronic device using the same
KR101015613B1 (en) * 2010-02-24 2011-02-17 한국기계연구원 Method for forming metal pattern on transparent substrate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005045911A1 (en) * 2003-11-11 2005-05-19 Asahi Glass Company, Limited Pattern formation method, electronic circuit manufactured by the same, and electronic device using the same
US7790358B2 (en) 2003-11-11 2010-09-07 Asahi Glass Company, Limited Pattern formation method, electronic circuit manufactured by the same, and electronic device using the same
KR101015613B1 (en) * 2010-02-24 2011-02-17 한국기계연구원 Method for forming metal pattern on transparent substrate

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