JPS57212445A - Production of photomask - Google Patents
Production of photomaskInfo
- Publication number
- JPS57212445A JPS57212445A JP9780281A JP9780281A JPS57212445A JP S57212445 A JPS57212445 A JP S57212445A JP 9780281 A JP9780281 A JP 9780281A JP 9780281 A JP9780281 A JP 9780281A JP S57212445 A JPS57212445 A JP S57212445A
- Authority
- JP
- Japan
- Prior art keywords
- film
- pattern
- substrate
- photomask
- light shielding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE:To produce a photomask containing a high-accuracy light shielding pattern in an easy and stable way, by forming first a resin pattern by exposing an image to light at the side of a glass substrate when the photomask is produced by a lift-off process. CONSTITUTION:A positive photosensitive resin film 12' is formed on a single surface of a glass mask substrate 11, and the pattern exposure 13 is carried out at the side of the substrate 11. The film 12' is developed to form a positive photosensitive resin pattern 12 on the substrate 11. Then a light shielding material film 14' is formed, and the light shielding film material on the pattern 12 is removed together with the film 12'. The film 14' on the substrate 11 is separated from the film 14' on the resist pattern 12. As a result, no loss is caused to the film 14 due to the lift-off process. Thus a photomask of high accuracy can be produced in an easy and stable way.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9780281A JPS57212445A (en) | 1981-06-24 | 1981-06-24 | Production of photomask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9780281A JPS57212445A (en) | 1981-06-24 | 1981-06-24 | Production of photomask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS57212445A true JPS57212445A (en) | 1982-12-27 |
Family
ID=14201908
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9780281A Pending JPS57212445A (en) | 1981-06-24 | 1981-06-24 | Production of photomask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57212445A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005045911A1 (en) * | 2003-11-11 | 2005-05-19 | Asahi Glass Company, Limited | Pattern formation method, electronic circuit manufactured by the same, and electronic device using the same |
| KR101015613B1 (en) * | 2010-02-24 | 2011-02-17 | 한국기계연구원 | Method for forming metal pattern on transparent substrate |
-
1981
- 1981-06-24 JP JP9780281A patent/JPS57212445A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005045911A1 (en) * | 2003-11-11 | 2005-05-19 | Asahi Glass Company, Limited | Pattern formation method, electronic circuit manufactured by the same, and electronic device using the same |
| US7790358B2 (en) | 2003-11-11 | 2010-09-07 | Asahi Glass Company, Limited | Pattern formation method, electronic circuit manufactured by the same, and electronic device using the same |
| KR101015613B1 (en) * | 2010-02-24 | 2011-02-17 | 한국기계연구원 | Method for forming metal pattern on transparent substrate |
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