JPS5574544A - Photo mask correcting method - Google Patents

Abstract

PURPOSE:To mask the restoration of the dropped-out parts easy by coating photosensitive resin on the surface of the side having patterns, selectively exposing only the dropped-out parts, then removing the resin of the exposed parts and making the glass of the dropped-out parts non-transparent with a hydrofluoric-acid-base processing solution in correcting the pattern dropped-out parts. CONSTITUTION:In the correcting the dropped-out part 3 of the metal film pattern 2 on, e.g., a glass substrate 1 in a photo mask for semiconductor device production, etc., said part is restored by coating photosensitive resin 6 of positive type over the entire surface, giving exposure to a minimum range including the dropped-out part 3, developing the same and removing the resin of the exposed part, thence dropping a processing solution 7 of hydrofluoric acid or hydrofluoric acid and NH4F, etc. on the exposed dropped-out part 3 thereby making the glass surface of the substrate 1 non-transparent 8. Thus, protrusion of non-transparent part 8 is prevented and occurence of poor contact with mask and wafer, etc. is eliminated.