JPS5491183A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS5491183A
JPS5491183A JP16069977A JP16069977A JPS5491183A JP S5491183 A JPS5491183 A JP S5491183A JP 16069977 A JP16069977 A JP 16069977A JP 16069977 A JP16069977 A JP 16069977A JP S5491183 A JPS5491183 A JP S5491183A
Authority
JP
Japan
Prior art keywords
pattern
substrate
reverse face
patterns
glass plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16069977A
Other languages
Japanese (ja)
Other versions
JPS576688B2 (en
Inventor
Tatsuyuki Sanada
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16069977A priority Critical patent/JPS576688B2/ja
Publication of JPS5491183A publication Critical patent/JPS5491183A/en
Publication of JPS576688B2 publication Critical patent/JPS576688B2/ja
Expired legal-status Critical Current

Links

Abstract

PURPOSE: To prevent the relative positional slippage between patterns on the surface and the reverse face by fixing a substrate, where a pattern is formed on the reverse face, onto a transparent glass plate larger than the substrate and forming a pattern on the surface while observing the pattern on the reverse face.
CONSTITUTION: Prescribed pattern 2 is formed on the reverse face of semiconductor subsrtrate 1, and photo resistor 4 is used to fix substrate 1 on transparent glass plate 3, which is vertically and horizontally larger than substrate 1, so that pattern 2 may be facedown. Next, photo resistor 5 is applied throughout the surface of glass plate 3 including substrate 1 and is developed by light exposure, thereby forming surface pattern 6. At this time, a two-sided mask positioning unit is used for mask positioning, and positioning is performed while observing relatively patterns 2 and 3 optically on a basis of reverseface pattern 2. Thus, the relative positional relation between two-sided patterns can be inspected very simply and non-destructively.
COPYRIGHT: (C)1979,JPO&Japio
JP16069977A 1977-12-28 1977-12-28 Expired JPS576688B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16069977A JPS576688B2 (en) 1977-12-28 1977-12-28

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16069977A JPS576688B2 (en) 1977-12-28 1977-12-28

Publications (2)

Publication Number Publication Date
JPS5491183A true JPS5491183A (en) 1979-07-19
JPS576688B2 JPS576688B2 (en) 1982-02-06

Family

ID=15720548

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16069977A Expired JPS576688B2 (en) 1977-12-28 1977-12-28

Country Status (1)

Country Link
JP (1) JPS576688B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62115164A (en) * 1985-11-14 1987-05-26 Hitachi Ltd Method and device for forming pattern
JP2009163237A (en) * 2007-12-19 2009-07-23 Asml Netherlands Bv Lithographic method
US20160299420A1 (en) * 2015-04-13 2016-10-13 Boe Technology Group Co., Ltd. Mask, manufacturing method thereof and exposure apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62115164A (en) * 1985-11-14 1987-05-26 Hitachi Ltd Method and device for forming pattern
JP2009163237A (en) * 2007-12-19 2009-07-23 Asml Netherlands Bv Lithographic method
US20160299420A1 (en) * 2015-04-13 2016-10-13 Boe Technology Group Co., Ltd. Mask, manufacturing method thereof and exposure apparatus

Also Published As

Publication number Publication date
JPS576688B2 (en) 1982-02-06

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