JPS57102015A - Pattern formation - Google Patents

Pattern formation

Info

Publication number
JPS57102015A
JPS57102015A JP55177266A JP17726680A JPS57102015A JP S57102015 A JPS57102015 A JP S57102015A JP 55177266 A JP55177266 A JP 55177266A JP 17726680 A JP17726680 A JP 17726680A JP S57102015 A JPS57102015 A JP S57102015A
Authority
JP
Japan
Prior art keywords
photosensitive resin
substrate
transparent conductive
ultraviolet rays
permeability
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55177266A
Other languages
Japanese (ja)
Other versions
JPH0361931B2 (en
Inventor
Keiichi Aoki
Masateru Wakui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP55177266A priority Critical patent/JPS57102015A/en
Publication of JPS57102015A publication Critical patent/JPS57102015A/en
Publication of JPH0361931B2 publication Critical patent/JPH0361931B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Landscapes

  • Liquid Crystal (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To prevent a photoresist film of one side of a substrate from being sensitized by ultraviolet rays applied from the other side of the substrate by using a transparent conductive film with permeability of not more than 50%. CONSTITUTION:Transparent conductive films 12 with permeability of not more than 50% for ultraviolet rays of 250-700mm. wavelength band are formed on a transparent substrate 2a and are coated by photosensitive resin 13a, 13b. Exposure masks 14a, 14b are formed on both surfaces and the photosensitive resin is pattern-exposed by ultraviolet rays of 250-700mm. wavelength band and is developed. Then the transparent conductive films are etched using the photosensitive resin 13a, 13b as masks and the photosensitive resin is removed. With above method the rays applied from one side of the substrate do not sensitize the photoresist film on the other side, so that both sides can be exposed at the same time and the operation rate of equipments can be improved.
JP55177266A 1980-12-17 1980-12-17 Pattern formation Granted JPS57102015A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55177266A JPS57102015A (en) 1980-12-17 1980-12-17 Pattern formation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55177266A JPS57102015A (en) 1980-12-17 1980-12-17 Pattern formation

Publications (2)

Publication Number Publication Date
JPS57102015A true JPS57102015A (en) 1982-06-24
JPH0361931B2 JPH0361931B2 (en) 1991-09-24

Family

ID=16028048

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55177266A Granted JPS57102015A (en) 1980-12-17 1980-12-17 Pattern formation

Country Status (1)

Country Link
JP (1) JPS57102015A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59176741A (en) * 1983-03-28 1984-10-06 Hoya Corp Pattern forming method of translucent thin film
JPS60233653A (en) * 1984-05-07 1985-11-20 Stanley Electric Co Ltd Photographic etching method
WO2001037246A1 (en) * 1999-11-16 2001-05-25 Citizen Watch Co., Ltd. Display

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59176741A (en) * 1983-03-28 1984-10-06 Hoya Corp Pattern forming method of translucent thin film
JPS60233653A (en) * 1984-05-07 1985-11-20 Stanley Electric Co Ltd Photographic etching method
WO2001037246A1 (en) * 1999-11-16 2001-05-25 Citizen Watch Co., Ltd. Display
US7012589B1 (en) 1999-11-16 2006-03-14 Citizen Watch Co., Ltd. Display

Also Published As

Publication number Publication date
JPH0361931B2 (en) 1991-09-24

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