JPS561534A - Manufacture of photomask - Google Patents

Manufacture of photomask

Info

Publication number
JPS561534A
JPS561534A JP7581579A JP7581579A JPS561534A JP S561534 A JPS561534 A JP S561534A JP 7581579 A JP7581579 A JP 7581579A JP 7581579 A JP7581579 A JP 7581579A JP S561534 A JPS561534 A JP S561534A
Authority
JP
Japan
Prior art keywords
pinhole
plate
resist
exposed
photomask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7581579A
Other languages
Japanese (ja)
Inventor
Tadanao Igarashi
Toshio Oguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP7581579A priority Critical patent/JPS561534A/en
Publication of JPS561534A publication Critical patent/JPS561534A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To simply correct a photomask, by selectively etching a pinhole portion to make it opaque. CONSTITUTION:If there is a pinhole 3 in a Cr film pattern 2 on a transparent glass plate 1, the pattern and the plate are coated with a positive resist 6 first. A part of the resist, the area of which is slightly larger than that of the pinhole, is exposed to light. Development is effected. Only the part of the transparent plate, which corresponds to the pinhole ad is exposed, is dipped in an etching agent to etch the part of the plate to roughen the surface of the part. The transmission factor of the surface to ultraviolet and visible rays is thus greatly reduced. This produces substantially the same effect as the elimination of the pinhole. The resist is finally removed for completion. According to this method, a mask of high accuracy can be manufactured.
JP7581579A 1979-06-15 1979-06-15 Manufacture of photomask Pending JPS561534A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7581579A JPS561534A (en) 1979-06-15 1979-06-15 Manufacture of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7581579A JPS561534A (en) 1979-06-15 1979-06-15 Manufacture of photomask

Publications (1)

Publication Number Publication Date
JPS561534A true JPS561534A (en) 1981-01-09

Family

ID=13587047

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7581579A Pending JPS561534A (en) 1979-06-15 1979-06-15 Manufacture of photomask

Country Status (1)

Country Link
JP (1) JPS561534A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6113281U (en) * 1984-06-27 1986-01-25 株式会社日立製作所 cold box

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5574544A (en) * 1978-11-30 1980-06-05 Mitsubishi Electric Corp Photo mask correcting method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5574544A (en) * 1978-11-30 1980-06-05 Mitsubishi Electric Corp Photo mask correcting method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6113281U (en) * 1984-06-27 1986-01-25 株式会社日立製作所 cold box
JPH0328281Y2 (en) * 1984-06-27 1991-06-18

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