JPS5767930A - Photomask - Google Patents

Photomask

Info

Publication number
JPS5767930A
JPS5767930A JP14486980A JP14486980A JPS5767930A JP S5767930 A JPS5767930 A JP S5767930A JP 14486980 A JP14486980 A JP 14486980A JP 14486980 A JP14486980 A JP 14486980A JP S5767930 A JPS5767930 A JP S5767930A
Authority
JP
Japan
Prior art keywords
photoresist
film
transcribed
substrate
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14486980A
Other languages
Japanese (ja)
Inventor
Takeshi Sakashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP14486980A priority Critical patent/JPS5767930A/en
Publication of JPS5767930A publication Critical patent/JPS5767930A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To obtain a photomask with which a substrate to be transcribed can be separated easily after a contact exposure, by coating a separation promoting film having a low level of viscidity to the substrate to be transcribed on a proper region on the surface of the photomask. CONSTITUTION:The photoresist is applied on a blank plate containing a light shielding film formed on a glass substrate 21, and a pattern is transcribed to the photoresist to form a photoresist film containing a desired pattern. The light shielding film is etched by using the photoresist film as a mask to obtain a light shielding film 22 containing a desired pattern. After this, the photoresist is applied again on the film 22 to perform an exposure. In this case of exposure, the photoresist is removed in a range slightly smaller than a substrate to be transcribed. The ultravilet rays are cut off so that the photoresist has its inner circumference fringe at the area slightly smaller than the substrate to be transcribed and remains over the outer circumference of a photomask 2b. After the exposure, a separation promoting film 24a is formed with the residual photoresist film.
JP14486980A 1980-10-15 1980-10-15 Photomask Pending JPS5767930A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14486980A JPS5767930A (en) 1980-10-15 1980-10-15 Photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14486980A JPS5767930A (en) 1980-10-15 1980-10-15 Photomask

Publications (1)

Publication Number Publication Date
JPS5767930A true JPS5767930A (en) 1982-04-24

Family

ID=15372275

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14486980A Pending JPS5767930A (en) 1980-10-15 1980-10-15 Photomask

Country Status (1)

Country Link
JP (1) JPS5767930A (en)

Similar Documents

Publication Publication Date Title
JPS55150225A (en) Method of correcting white spot fault of photomask
JPS5630129A (en) Manufacture of photomask
JPS5767930A (en) Photomask
JPS5672445A (en) Production of photomask
JPS576849A (en) Photomask and its preparation
JPS57148706A (en) Production of color filter
JPS5596952A (en) Production of photomask
JPS5670553A (en) Photomask for projection exposure
JPS55128832A (en) Method of making minute pattern
JPS5689741A (en) Dryplate for photomasking
JPS5339060A (en) Lot number marking method to wafers
JPS53110379A (en) Optical filter and its manufacture
JPS5744150A (en) Photomask
JPS5742043A (en) Photosensitive material
JPS5618420A (en) Manufacture of semiconductor device
JPS57212445A (en) Production of photomask
JPS5655950A (en) Photographic etching method
JPS576848A (en) Photomask and its preparation
JPS5612736A (en) Formation of fine chromium pattern
JPS5734506A (en) Production of color filter
JPS57112025A (en) Formation of pattern
JPS56130750A (en) Manufacture of mask
JPS53128277A (en) Projection exposure method for negative resist
JPS5619623A (en) Photomask
JPS5699342A (en) Manufacture of photomask