JPS5670553A - Photomask for projection exposure - Google Patents

Photomask for projection exposure

Info

Publication number
JPS5670553A
JPS5670553A JP14742279A JP14742279A JPS5670553A JP S5670553 A JPS5670553 A JP S5670553A JP 14742279 A JP14742279 A JP 14742279A JP 14742279 A JP14742279 A JP 14742279A JP S5670553 A JPS5670553 A JP S5670553A
Authority
JP
Japan
Prior art keywords
cover
face
pattern
photomask
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14742279A
Other languages
Japanese (ja)
Inventor
Takayuki Yanagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP14742279A priority Critical patent/JPS5670553A/en
Publication of JPS5670553A publication Critical patent/JPS5670553A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To prevent trouble due to fixing a protective cover, by providing the cover located apart from a photomask pattern for use in pattern formation of integrated circuits at an interval larger than the focal depth of the optical system of an exposing device for exposing the pattern. CONSTITUTION:Protective glass cover 4 having in the middle part a recess larger than the pattern forming region of mask pattern forming face 2 of photomask glass substrate 1 is stuck to substrate 1 on sticking face 5. When ultraviolet rays fall on mask 8 from light source 6 through condenser lens 7 and further fall on the body 10 to be processed through contracting lens 9, and the distance between the inner face of cover 4 and pattern face 2 is, for example, several times as much as the focal depth of lens 9, even if a scratch is made on the surface of cover 4, its image is made vague and is not formed on the face of body 10, thus permitting bubbles occurring in the adhesive layer caused by sticking the whole surface of cover 4, and trouble due to aging change of the adhesive layer to be prevented.
JP14742279A 1979-11-14 1979-11-14 Photomask for projection exposure Pending JPS5670553A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14742279A JPS5670553A (en) 1979-11-14 1979-11-14 Photomask for projection exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14742279A JPS5670553A (en) 1979-11-14 1979-11-14 Photomask for projection exposure

Publications (1)

Publication Number Publication Date
JPS5670553A true JPS5670553A (en) 1981-06-12

Family

ID=15429950

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14742279A Pending JPS5670553A (en) 1979-11-14 1979-11-14 Photomask for projection exposure

Country Status (1)

Country Link
JP (1) JPS5670553A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6257260U (en) * 1985-09-26 1987-04-09
US4833051A (en) * 1984-08-20 1989-05-23 Nippon Kogaku K.K. Protective device for photographic masks
US6841317B2 (en) 2002-08-27 2005-01-11 Micro Lithography, Inc. Vent for an optical pellicle system
CN106475360A (en) * 2015-08-31 2017-03-08 优志旺电机株式会社 Apparatus for ultraviolet light treamtent

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4063812A (en) * 1976-08-12 1977-12-20 International Business Machines Corporation Projection printing system with an improved mask configuration
US4131363A (en) * 1977-12-05 1978-12-26 International Business Machines Corporation Pellicle cover for projection printing system

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4063812A (en) * 1976-08-12 1977-12-20 International Business Machines Corporation Projection printing system with an improved mask configuration
US4131363A (en) * 1977-12-05 1978-12-26 International Business Machines Corporation Pellicle cover for projection printing system

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4833051A (en) * 1984-08-20 1989-05-23 Nippon Kogaku K.K. Protective device for photographic masks
JPS6257260U (en) * 1985-09-26 1987-04-09
US6841317B2 (en) 2002-08-27 2005-01-11 Micro Lithography, Inc. Vent for an optical pellicle system
CN106475360A (en) * 2015-08-31 2017-03-08 优志旺电机株式会社 Apparatus for ultraviolet light treamtent

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