JPS5670553A - Photomask for projection exposure - Google Patents
Photomask for projection exposureInfo
- Publication number
- JPS5670553A JPS5670553A JP14742279A JP14742279A JPS5670553A JP S5670553 A JPS5670553 A JP S5670553A JP 14742279 A JP14742279 A JP 14742279A JP 14742279 A JP14742279 A JP 14742279A JP S5670553 A JPS5670553 A JP S5670553A
- Authority
- JP
- Japan
- Prior art keywords
- cover
- face
- pattern
- photomask
- lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE:To prevent trouble due to fixing a protective cover, by providing the cover located apart from a photomask pattern for use in pattern formation of integrated circuits at an interval larger than the focal depth of the optical system of an exposing device for exposing the pattern. CONSTITUTION:Protective glass cover 4 having in the middle part a recess larger than the pattern forming region of mask pattern forming face 2 of photomask glass substrate 1 is stuck to substrate 1 on sticking face 5. When ultraviolet rays fall on mask 8 from light source 6 through condenser lens 7 and further fall on the body 10 to be processed through contracting lens 9, and the distance between the inner face of cover 4 and pattern face 2 is, for example, several times as much as the focal depth of lens 9, even if a scratch is made on the surface of cover 4, its image is made vague and is not formed on the face of body 10, thus permitting bubbles occurring in the adhesive layer caused by sticking the whole surface of cover 4, and trouble due to aging change of the adhesive layer to be prevented.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14742279A JPS5670553A (en) | 1979-11-14 | 1979-11-14 | Photomask for projection exposure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14742279A JPS5670553A (en) | 1979-11-14 | 1979-11-14 | Photomask for projection exposure |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5670553A true JPS5670553A (en) | 1981-06-12 |
Family
ID=15429950
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14742279A Pending JPS5670553A (en) | 1979-11-14 | 1979-11-14 | Photomask for projection exposure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5670553A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6257260U (en) * | 1985-09-26 | 1987-04-09 | ||
US4833051A (en) * | 1984-08-20 | 1989-05-23 | Nippon Kogaku K.K. | Protective device for photographic masks |
US6841317B2 (en) | 2002-08-27 | 2005-01-11 | Micro Lithography, Inc. | Vent for an optical pellicle system |
CN106475360A (en) * | 2015-08-31 | 2017-03-08 | 优志旺电机株式会社 | Apparatus for ultraviolet light treamtent |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4063812A (en) * | 1976-08-12 | 1977-12-20 | International Business Machines Corporation | Projection printing system with an improved mask configuration |
US4131363A (en) * | 1977-12-05 | 1978-12-26 | International Business Machines Corporation | Pellicle cover for projection printing system |
-
1979
- 1979-11-14 JP JP14742279A patent/JPS5670553A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4063812A (en) * | 1976-08-12 | 1977-12-20 | International Business Machines Corporation | Projection printing system with an improved mask configuration |
US4131363A (en) * | 1977-12-05 | 1978-12-26 | International Business Machines Corporation | Pellicle cover for projection printing system |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4833051A (en) * | 1984-08-20 | 1989-05-23 | Nippon Kogaku K.K. | Protective device for photographic masks |
JPS6257260U (en) * | 1985-09-26 | 1987-04-09 | ||
US6841317B2 (en) | 2002-08-27 | 2005-01-11 | Micro Lithography, Inc. | Vent for an optical pellicle system |
CN106475360A (en) * | 2015-08-31 | 2017-03-08 | 优志旺电机株式会社 | Apparatus for ultraviolet light treamtent |
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