JPS5636134A - Forming method for pattern of semiconductor substrate - Google Patents

Forming method for pattern of semiconductor substrate

Info

Publication number
JPS5636134A
JPS5636134A JP11164979A JP11164979A JPS5636134A JP S5636134 A JPS5636134 A JP S5636134A JP 11164979 A JP11164979 A JP 11164979A JP 11164979 A JP11164979 A JP 11164979A JP S5636134 A JPS5636134 A JP S5636134A
Authority
JP
Japan
Prior art keywords
film
pattern
polymethyl methacrylate
methacrylate
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11164979A
Other languages
Japanese (ja)
Other versions
JPS6152567B2 (en
Inventor
Ken Ogura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP11164979A priority Critical patent/JPS5636134A/en
Publication of JPS5636134A publication Critical patent/JPS5636134A/en
Publication of JPS6152567B2 publication Critical patent/JPS6152567B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers

Abstract

PURPOSE:To enable the formation of a minute pattern by a method wherein a copolymer film of polyglycidil methacrylate and polymethyl methacrylate, a polymethyl methacrylate film and the third resist film, which has a light shielding property to lower portions, are formed on the substrate. CONSTITUTION:The first resist film 3 consisting of a copolymer of polyglycidil methacrylate and polymethyl methacrylate, the second film 4 consisting of polymethyl methacrylate and the third film 5' consisting of AZ1 350, etc. are successively made up on the Si substrate 1 with a PSG film 2. The film 5' is patterned first, ultraviolet rays are irradiated, and the film is developed, thus obtaining a pattern 3' of the first film 3 (the second film 4 is dissolved). Thus, high resolution is gained by the second and third resist films 4, 5', a high resisting property and an adhering property to wet etching are acquired by the first resist film 3, and a minute pattern of the semiconductor device highly integrated can be formed.
JP11164979A 1979-09-03 1979-09-03 Forming method for pattern of semiconductor substrate Granted JPS5636134A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11164979A JPS5636134A (en) 1979-09-03 1979-09-03 Forming method for pattern of semiconductor substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11164979A JPS5636134A (en) 1979-09-03 1979-09-03 Forming method for pattern of semiconductor substrate

Publications (2)

Publication Number Publication Date
JPS5636134A true JPS5636134A (en) 1981-04-09
JPS6152567B2 JPS6152567B2 (en) 1986-11-13

Family

ID=14566667

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11164979A Granted JPS5636134A (en) 1979-09-03 1979-09-03 Forming method for pattern of semiconductor substrate

Country Status (1)

Country Link
JP (1) JPS5636134A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59125624A (en) * 1982-12-29 1984-07-20 Fujitsu Ltd Forming method of pattern
JPS60106132A (en) * 1983-11-15 1985-06-11 Fujitsu Ltd Formation of pattern

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59125624A (en) * 1982-12-29 1984-07-20 Fujitsu Ltd Forming method of pattern
JPH0376574B2 (en) * 1982-12-29 1991-12-05 Fujitsu Ltd
JPS60106132A (en) * 1983-11-15 1985-06-11 Fujitsu Ltd Formation of pattern
JPH0458168B2 (en) * 1983-11-15 1992-09-16 Fujitsu Ltd

Also Published As

Publication number Publication date
JPS6152567B2 (en) 1986-11-13

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