JPS5595324A - Manufacturing method of semiconductor device - Google Patents
Manufacturing method of semiconductor deviceInfo
- Publication number
- JPS5595324A JPS5595324A JP16581578A JP16581578A JPS5595324A JP S5595324 A JPS5595324 A JP S5595324A JP 16581578 A JP16581578 A JP 16581578A JP 16581578 A JP16581578 A JP 16581578A JP S5595324 A JPS5595324 A JP S5595324A
- Authority
- JP
- Japan
- Prior art keywords
- opening
- film
- processing
- ultraviolet light
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To perform processing and disposition of various kinds by a construction wherein the mask has photoresist layers of different sensitivity wave-length each other.
CONSTITUTION: The positive type resist which is suitable for fine processing pattern is adopted. First, the polymethyl methacrylate film 12 is applied to the substrate 11 and exposed to far-ultraviolet light of 200W300nm through the mask pattern and the opening 12A is obtained by development. Next, another photoresist film 14 which is sensitive for wavelength 190W260nm is applied to it, and exposed to the ultraviolet light through the mask pattern of the wider opening than the opening 12A, and the opening 14A is obtained by development. In the second exposure the opening 12A on the film 14 will not grow on account of low sensitivity of film 12 to ultraviolet light. Thus the two layered mask which has different pattern each other is obtained by the positive type resists of different sensitivity wavelength. So simplification of processing or processing of the device that has special structure is possible.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16581578A JPS5595324A (en) | 1978-12-30 | 1978-12-30 | Manufacturing method of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16581578A JPS5595324A (en) | 1978-12-30 | 1978-12-30 | Manufacturing method of semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5595324A true JPS5595324A (en) | 1980-07-19 |
JPS57645B2 JPS57645B2 (en) | 1982-01-07 |
Family
ID=15819514
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16581578A Granted JPS5595324A (en) | 1978-12-30 | 1978-12-30 | Manufacturing method of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5595324A (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02302037A (en) * | 1989-05-16 | 1990-12-14 | Mitsubishi Electric Corp | Formation of pattern |
US6051454A (en) * | 1997-09-11 | 2000-04-18 | Matsushita Electric Industrial Co., Ltd. | Semiconductor device and method for fabricating the same |
DE10233209A1 (en) * | 2002-07-22 | 2004-02-05 | Infineon Technologies Ag | Irradiating resist during the production of integrated switching arrangement comprises forming radiation-sensitive resist layer arrangement after producing layer to be structured and irradiating the resist layer arrangement |
US6960424B2 (en) * | 2001-07-11 | 2005-11-01 | Canon Kabushiki Kaisha | Method for manufacturing microstructure, method for manufacturing liquid discharge head, and liquid discharge head |
CN102830588A (en) * | 2012-09-19 | 2012-12-19 | 上海华力微电子有限公司 | Method for fabricating phase-shift photomask |
CN102841499A (en) * | 2012-09-19 | 2012-12-26 | 上海华力微电子有限公司 | Phase-shift photomask fabrication method |
CN102866575A (en) * | 2012-10-12 | 2013-01-09 | 上海华力微电子有限公司 | Manufacture method of phase-shift optical mask |
CN102879996A (en) * | 2012-10-12 | 2013-01-16 | 上海华力微电子有限公司 | Method for manufacturing phase shift photomask |
CN102902153A (en) * | 2012-11-12 | 2013-01-30 | 上海华力微电子有限公司 | Method for fabricating phase shift photomask |
CN105980936A (en) * | 2014-02-17 | 2016-09-28 | 富士胶片株式会社 | Pattern forming method, etching method, method for manufacturing electronic device, and electronic device |
-
1978
- 1978-12-30 JP JP16581578A patent/JPS5595324A/en active Granted
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02302037A (en) * | 1989-05-16 | 1990-12-14 | Mitsubishi Electric Corp | Formation of pattern |
US6051454A (en) * | 1997-09-11 | 2000-04-18 | Matsushita Electric Industrial Co., Ltd. | Semiconductor device and method for fabricating the same |
US6960424B2 (en) * | 2001-07-11 | 2005-11-01 | Canon Kabushiki Kaisha | Method for manufacturing microstructure, method for manufacturing liquid discharge head, and liquid discharge head |
US7526863B2 (en) | 2001-07-11 | 2009-05-05 | Canon Kabushiki Kaisha | Method for manufacturing a microstructure |
DE10233209A1 (en) * | 2002-07-22 | 2004-02-05 | Infineon Technologies Ag | Irradiating resist during the production of integrated switching arrangement comprises forming radiation-sensitive resist layer arrangement after producing layer to be structured and irradiating the resist layer arrangement |
CN102830588A (en) * | 2012-09-19 | 2012-12-19 | 上海华力微电子有限公司 | Method for fabricating phase-shift photomask |
CN102841499A (en) * | 2012-09-19 | 2012-12-26 | 上海华力微电子有限公司 | Phase-shift photomask fabrication method |
CN102866575A (en) * | 2012-10-12 | 2013-01-09 | 上海华力微电子有限公司 | Manufacture method of phase-shift optical mask |
CN102879996A (en) * | 2012-10-12 | 2013-01-16 | 上海华力微电子有限公司 | Method for manufacturing phase shift photomask |
CN102902153A (en) * | 2012-11-12 | 2013-01-30 | 上海华力微电子有限公司 | Method for fabricating phase shift photomask |
CN105980936A (en) * | 2014-02-17 | 2016-09-28 | 富士胶片株式会社 | Pattern forming method, etching method, method for manufacturing electronic device, and electronic device |
US9810981B2 (en) | 2014-02-17 | 2017-11-07 | Fujifilm Corporation | Pattern formation method, etching method, electronic device manufacturing method, and electronic device |
Also Published As
Publication number | Publication date |
---|---|
JPS57645B2 (en) | 1982-01-07 |
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