JPS57132008A - Measuring method for pattern size - Google Patents

Measuring method for pattern size

Info

Publication number
JPS57132008A
JPS57132008A JP1701381A JP1701381A JPS57132008A JP S57132008 A JPS57132008 A JP S57132008A JP 1701381 A JP1701381 A JP 1701381A JP 1701381 A JP1701381 A JP 1701381A JP S57132008 A JPS57132008 A JP S57132008A
Authority
JP
Japan
Prior art keywords
width
light shielding
pattern
sizes
shielding pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1701381A
Other languages
Japanese (ja)
Inventor
Nobuo Hasegawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1701381A priority Critical patent/JPS57132008A/en
Publication of JPS57132008A publication Critical patent/JPS57132008A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To perform the control of sizes easily in a short time by forming the images of a mask provided with plural pieces of light transmission patterns and light shielding patterns which are opposite to each other on a photoresist film and determining the sizes of the fine patterns from said images. CONSTITUTION:For example, a light shielding pattern 5 with 2mum width, and a light shielding pattern with 2mum width, a light shielding pattern with 1.6mum width and a light transmission pattern with 2.4mum width, a light shielding pattern with 2.4mum width and a light transmission pattern width 1.6mum width are disposed opposite in a photomask. Resist patterns are formed on a wafer by using this photomask. When the width of the resist patterns increases by 0.4mum (figure a), the width of the light transmission pattern 3' and the light shielding pattern 6' coincide and when it decreases by 0.4mum (figure b), the light transmission pattern 4'' and the light shielding pattern 7'' coincide, thus it can be observed with a microscope that the sizes are accepted. Thereby, the control of sizes is accomplished easily in a short time.
JP1701381A 1981-02-09 1981-02-09 Measuring method for pattern size Pending JPS57132008A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1701381A JPS57132008A (en) 1981-02-09 1981-02-09 Measuring method for pattern size

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1701381A JPS57132008A (en) 1981-02-09 1981-02-09 Measuring method for pattern size

Publications (1)

Publication Number Publication Date
JPS57132008A true JPS57132008A (en) 1982-08-16

Family

ID=11932108

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1701381A Pending JPS57132008A (en) 1981-02-09 1981-02-09 Measuring method for pattern size

Country Status (1)

Country Link
JP (1) JPS57132008A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5951539A (en) * 1982-09-17 1984-03-26 Nec Corp Semiconductor device
JPS5955029A (en) * 1982-09-24 1984-03-29 Fujitsu Ltd Length measurement of pattern width
JPS60145637A (en) * 1984-01-09 1985-08-01 Mitsubishi Electric Corp Pattern size measuring method of semiconductor device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5951539A (en) * 1982-09-17 1984-03-26 Nec Corp Semiconductor device
JPS5955029A (en) * 1982-09-24 1984-03-29 Fujitsu Ltd Length measurement of pattern width
JPS60145637A (en) * 1984-01-09 1985-08-01 Mitsubishi Electric Corp Pattern size measuring method of semiconductor device

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