JPS57168250A - Exposing method - Google Patents

Exposing method

Info

Publication number
JPS57168250A
JPS57168250A JP5383181A JP5383181A JPS57168250A JP S57168250 A JPS57168250 A JP S57168250A JP 5383181 A JP5383181 A JP 5383181A JP 5383181 A JP5383181 A JP 5383181A JP S57168250 A JPS57168250 A JP S57168250A
Authority
JP
Japan
Prior art keywords
pattern
patterns
mask
regions
different kinds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5383181A
Other languages
Japanese (ja)
Other versions
JPS6235102B2 (en
Inventor
Niwaji Majima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP5383181A priority Critical patent/JPS57168250A/en
Priority to EP81306134A priority patent/EP0055620B1/en
Priority to DE8181306134T priority patent/DE3173277D1/en
Priority to US06/333,814 priority patent/US4408875A/en
Publication of JPS57168250A publication Critical patent/JPS57168250A/en
Publication of JPS6235102B2 publication Critical patent/JPS6235102B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/0286—Programmable, customizable or modifiable circuits
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To expose continuously and easily different kinds of patterns by using a mask having variable pattern regions in the main pattern region and secondary patterns in the variable pattern regions in an exposing method for obtaining different kinds of patterns with one mask pattern. CONSTITUTION:Different kinds of projected patterns are obtd. on a photoresist film with one mask pattern for transfer. At this time, a mask for exposure having variable pattern regions 12, 13 in the main pattern region 14 and secondary pattern regions 15, 16 each consisting of a group of unit patterns for giving a prescribed pattern in the regions 12, 13 is used, and the unit patterns can be selected according to the moving distances of the mask and the wafer. Thus, pattern circuits with slightly different shapes can be formed easily and continuously by exposure.
JP5383181A 1980-12-29 1981-04-10 Exposing method Granted JPS57168250A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP5383181A JPS57168250A (en) 1981-04-10 1981-04-10 Exposing method
EP81306134A EP0055620B1 (en) 1980-12-29 1981-12-24 Method of projecting circuit patterns
DE8181306134T DE3173277D1 (en) 1980-12-29 1981-12-24 Method of projecting circuit patterns
US06/333,814 US4408875A (en) 1980-12-29 1981-12-31 Method of projecting circuit patterns

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5383181A JPS57168250A (en) 1981-04-10 1981-04-10 Exposing method

Publications (2)

Publication Number Publication Date
JPS57168250A true JPS57168250A (en) 1982-10-16
JPS6235102B2 JPS6235102B2 (en) 1987-07-30

Family

ID=12953726

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5383181A Granted JPS57168250A (en) 1980-12-29 1981-04-10 Exposing method

Country Status (1)

Country Link
JP (1) JPS57168250A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57112753A (en) * 1980-12-29 1982-07-13 Fujitsu Ltd Exposure method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57112753A (en) * 1980-12-29 1982-07-13 Fujitsu Ltd Exposure method

Also Published As

Publication number Publication date
JPS6235102B2 (en) 1987-07-30

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