JPS5656630A - Manufacture of semiconductor element - Google Patents
Manufacture of semiconductor elementInfo
- Publication number
- JPS5656630A JPS5656630A JP13261379A JP13261379A JPS5656630A JP S5656630 A JPS5656630 A JP S5656630A JP 13261379 A JP13261379 A JP 13261379A JP 13261379 A JP13261379 A JP 13261379A JP S5656630 A JPS5656630 A JP S5656630A
- Authority
- JP
- Japan
- Prior art keywords
- photoresist
- pattern
- mask pattern
- 3mum
- fine pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 5
- 230000004304 visual acuity Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE:To obtain a fine pattern by a method wherein a photoresist is placed upon the first pattern of the photoresist and then the second pattern is formed partly intersecting therewith. CONSTITUTION:From carrying out exposure and development according to a photoresist 3 are ever before, a mask pattern in the limit of 3-5mum is obtainable through resolving power of the photoresist and diffraction of the light. Further the photoresist is laminated, and a mask pattern 5 is formed, which is slightly shifted to intersect partly with the lower layer of mask pattern 3 at 1-3mum. According to this method, an oxidized film 2 can be exposed with a fine pattern coming in 1-3mum, and the fine pattern can be formed by means of a conventional resist equipment.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13261379A JPS5656630A (en) | 1979-10-15 | 1979-10-15 | Manufacture of semiconductor element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13261379A JPS5656630A (en) | 1979-10-15 | 1979-10-15 | Manufacture of semiconductor element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5656630A true JPS5656630A (en) | 1981-05-18 |
Family
ID=15085415
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13261379A Pending JPS5656630A (en) | 1979-10-15 | 1979-10-15 | Manufacture of semiconductor element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5656630A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009237270A (en) * | 2008-03-27 | 2009-10-15 | Mitsubishi Electric Corp | Pattern forming method, wiring structure, and electronic equipment |
-
1979
- 1979-10-15 JP JP13261379A patent/JPS5656630A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009237270A (en) * | 2008-03-27 | 2009-10-15 | Mitsubishi Electric Corp | Pattern forming method, wiring structure, and electronic equipment |
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