JPS5317076A - Silicon mask for x-ray exposure and its production - Google Patents
Silicon mask for x-ray exposure and its productionInfo
- Publication number
- JPS5317076A JPS5317076A JP9109976A JP9109976A JPS5317076A JP S5317076 A JPS5317076 A JP S5317076A JP 9109976 A JP9109976 A JP 9109976A JP 9109976 A JP9109976 A JP 9109976A JP S5317076 A JPS5317076 A JP S5317076A
- Authority
- JP
- Japan
- Prior art keywords
- production
- layer
- film
- ray exposure
- silicon mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To obtain a mask having line widths of less than 1 μm by making an Xray transmission layer with the 3 layered films laminated in the order of SiO2 film, Si3N4 film and SiO2 film, making an X-ray absorption layer through provision of a metal layer of arbitrary patterns on said layer and further providing reinforcing and supporting beams composed of Si on the other surface of the transmission layer.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9109976A JPS5317076A (en) | 1976-07-30 | 1976-07-30 | Silicon mask for x-ray exposure and its production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9109976A JPS5317076A (en) | 1976-07-30 | 1976-07-30 | Silicon mask for x-ray exposure and its production |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5317076A true JPS5317076A (en) | 1978-02-16 |
JPS5337704B2 JPS5337704B2 (en) | 1978-10-11 |
Family
ID=14017062
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9109976A Granted JPS5317076A (en) | 1976-07-30 | 1976-07-30 | Silicon mask for x-ray exposure and its production |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5317076A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4451544A (en) * | 1981-06-24 | 1984-05-29 | Tokyo Shibaura Denki Kabushiki Kaisha | Mask structure for X-ray lithography and method for manufacturing the same |
JPS6220310A (en) * | 1985-07-19 | 1987-01-28 | Nippon Telegr & Teleph Corp <Ntt> | X-ray mask |
JPS63200530A (en) * | 1987-02-17 | 1988-08-18 | Matsushita Electronics Corp | Manufacture of x-ray mask |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5192181A (en) * | 1975-02-10 | 1976-08-12 | X senrokopataankeiseihoho oyobi masukukiban |
-
1976
- 1976-07-30 JP JP9109976A patent/JPS5317076A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5192181A (en) * | 1975-02-10 | 1976-08-12 | X senrokopataankeiseihoho oyobi masukukiban |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4451544A (en) * | 1981-06-24 | 1984-05-29 | Tokyo Shibaura Denki Kabushiki Kaisha | Mask structure for X-ray lithography and method for manufacturing the same |
JPS6220310A (en) * | 1985-07-19 | 1987-01-28 | Nippon Telegr & Teleph Corp <Ntt> | X-ray mask |
JPS63200530A (en) * | 1987-02-17 | 1988-08-18 | Matsushita Electronics Corp | Manufacture of x-ray mask |
Also Published As
Publication number | Publication date |
---|---|
JPS5337704B2 (en) | 1978-10-11 |
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