JPS53104176A - Mask for x-ray exposure - Google Patents

Mask for x-ray exposure

Info

Publication number
JPS53104176A
JPS53104176A JP1868277A JP1868277A JPS53104176A JP S53104176 A JPS53104176 A JP S53104176A JP 1868277 A JP1868277 A JP 1868277A JP 1868277 A JP1868277 A JP 1868277A JP S53104176 A JPS53104176 A JP S53104176A
Authority
JP
Japan
Prior art keywords
mask
ray exposure
face
film
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1868277A
Other languages
Japanese (ja)
Other versions
JPS5540178B2 (en
Inventor
Masao Sadamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP1868277A priority Critical patent/JPS53104176A/en
Publication of JPS53104176A publication Critical patent/JPS53104176A/en
Publication of JPS5540178B2 publication Critical patent/JPS5540178B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To product a durable mask which is easy to handle and is improved in dimensional precision and has a small quantity of pattern defects, by causing a hard Si3N4 film to adhere to one face of a X-ray absorber pattern and providing a soft plastic film on the ther face.
COPYRIGHT: (C)1978,JPO&Japio
JP1868277A 1977-02-24 1977-02-24 Mask for x-ray exposure Granted JPS53104176A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1868277A JPS53104176A (en) 1977-02-24 1977-02-24 Mask for x-ray exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1868277A JPS53104176A (en) 1977-02-24 1977-02-24 Mask for x-ray exposure

Publications (2)

Publication Number Publication Date
JPS53104176A true JPS53104176A (en) 1978-09-11
JPS5540178B2 JPS5540178B2 (en) 1980-10-16

Family

ID=11978368

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1868277A Granted JPS53104176A (en) 1977-02-24 1977-02-24 Mask for x-ray exposure

Country Status (1)

Country Link
JP (1) JPS53104176A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54142071A (en) * 1978-04-27 1979-11-05 Cho Lsi Gijutsu Kenkyu Kumiai Method of fabricating xxray exposure mask
JPS62244132A (en) * 1986-04-17 1987-10-24 Sanyo Electric Co Ltd Manufacture of mask for short wave length lithography
JPS647522A (en) * 1987-06-30 1989-01-11 Oki Electric Ind Co Ltd X-ray mask and manufacture thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54142071A (en) * 1978-04-27 1979-11-05 Cho Lsi Gijutsu Kenkyu Kumiai Method of fabricating xxray exposure mask
JPS62244132A (en) * 1986-04-17 1987-10-24 Sanyo Electric Co Ltd Manufacture of mask for short wave length lithography
JPS647522A (en) * 1987-06-30 1989-01-11 Oki Electric Ind Co Ltd X-ray mask and manufacture thereof

Also Published As

Publication number Publication date
JPS5540178B2 (en) 1980-10-16

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