JPS53104176A - Mask for x-ray exposure - Google Patents
Mask for x-ray exposureInfo
- Publication number
- JPS53104176A JPS53104176A JP1868277A JP1868277A JPS53104176A JP S53104176 A JPS53104176 A JP S53104176A JP 1868277 A JP1868277 A JP 1868277A JP 1868277 A JP1868277 A JP 1868277A JP S53104176 A JPS53104176 A JP S53104176A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- ray exposure
- face
- film
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To product a durable mask which is easy to handle and is improved in dimensional precision and has a small quantity of pattern defects, by causing a hard Si3N4 film to adhere to one face of a X-ray absorber pattern and providing a soft plastic film on the ther face.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1868277A JPS53104176A (en) | 1977-02-24 | 1977-02-24 | Mask for x-ray exposure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1868277A JPS53104176A (en) | 1977-02-24 | 1977-02-24 | Mask for x-ray exposure |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS53104176A true JPS53104176A (en) | 1978-09-11 |
JPS5540178B2 JPS5540178B2 (en) | 1980-10-16 |
Family
ID=11978368
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1868277A Granted JPS53104176A (en) | 1977-02-24 | 1977-02-24 | Mask for x-ray exposure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53104176A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54142071A (en) * | 1978-04-27 | 1979-11-05 | Cho Lsi Gijutsu Kenkyu Kumiai | Method of fabricating xxray exposure mask |
JPS62244132A (en) * | 1986-04-17 | 1987-10-24 | Sanyo Electric Co Ltd | Manufacture of mask for short wave length lithography |
JPS647522A (en) * | 1987-06-30 | 1989-01-11 | Oki Electric Ind Co Ltd | X-ray mask and manufacture thereof |
-
1977
- 1977-02-24 JP JP1868277A patent/JPS53104176A/en active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54142071A (en) * | 1978-04-27 | 1979-11-05 | Cho Lsi Gijutsu Kenkyu Kumiai | Method of fabricating xxray exposure mask |
JPS62244132A (en) * | 1986-04-17 | 1987-10-24 | Sanyo Electric Co Ltd | Manufacture of mask for short wave length lithography |
JPS647522A (en) * | 1987-06-30 | 1989-01-11 | Oki Electric Ind Co Ltd | X-ray mask and manufacture thereof |
Also Published As
Publication number | Publication date |
---|---|
JPS5540178B2 (en) | 1980-10-16 |
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