JPS54142071A - Method of fabricating xxray exposure mask - Google Patents

Method of fabricating xxray exposure mask

Info

Publication number
JPS54142071A
JPS54142071A JP5041178A JP5041178A JPS54142071A JP S54142071 A JPS54142071 A JP S54142071A JP 5041178 A JP5041178 A JP 5041178A JP 5041178 A JP5041178 A JP 5041178A JP S54142071 A JPS54142071 A JP S54142071A
Authority
JP
Japan
Prior art keywords
xxray
fabricating
exposure mask
mask
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5041178A
Other languages
Japanese (ja)
Inventor
Teruo Shirai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHO LSI GIJUTSU KENKYU KUMIAI
Priority to JP5041178A priority Critical patent/JPS54142071A/en
Publication of JPS54142071A publication Critical patent/JPS54142071A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP5041178A 1978-04-27 1978-04-27 Method of fabricating xxray exposure mask Pending JPS54142071A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5041178A JPS54142071A (en) 1978-04-27 1978-04-27 Method of fabricating xxray exposure mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5041178A JPS54142071A (en) 1978-04-27 1978-04-27 Method of fabricating xxray exposure mask

Publications (1)

Publication Number Publication Date
JPS54142071A true JPS54142071A (en) 1979-11-05

Family

ID=12858113

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5041178A Pending JPS54142071A (en) 1978-04-27 1978-04-27 Method of fabricating xxray exposure mask

Country Status (1)

Country Link
JP (1) JPS54142071A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62190340U (en) * 1986-05-26 1987-12-03

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53104176A (en) * 1977-02-24 1978-09-11 Oki Electric Ind Co Ltd Mask for x-ray exposure

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53104176A (en) * 1977-02-24 1978-09-11 Oki Electric Ind Co Ltd Mask for x-ray exposure

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62190340U (en) * 1986-05-26 1987-12-03

Similar Documents

Publication Publication Date Title
JPS54143074A (en) Method of forming mask
JPS54131935A (en) Method of fabricating positive resist image
JPS54121114A (en) Method of correcting developing profile of photoresist
JPS52149979A (en) Mask structure for xxray lithography and method of manufacture thereof
JPS5429574A (en) Method of forming antiifluidity resist mask
JPS5379466A (en) Method of forming negative mask
JPS54158917A (en) Method of producing photographic material
GB2066487B (en) Alignment of exposure masks
JPS54151832A (en) Method of fabricating projecting screen
JPS54158883A (en) Method of fabricating field effect transintor
JPS5333701A (en) Method of forming mask image
JPS5669831A (en) Method of manufacturing xxray mask
JPS54114977A (en) Method of contact exposing positive photo resist
JPS5769743A (en) Method of forming resist mask
JPS5341984A (en) Method of positioning exposure mask
GB2040101B (en) Method of fabricating printed ciurcuits
JPS52153673A (en) Method of manufacturing mask for xxray lithography
JPS54142072A (en) Method of fabricating xxray exposure mask
JPS54142071A (en) Method of fabricating xxray exposure mask
JPS54115073A (en) Xxray exposure mask and method of fabricating same
JPS54143231A (en) Method of fabricating photoresist image
JPS54132171A (en) Method of fabricating xxray exposure mask
JPS54118777A (en) Method of exposing pattern
JPS54124977A (en) Xxray exposure mask
JPS54141082A (en) Method of fabricating sealeddbeam lamp