JPS54118777A - Method of exposing pattern - Google Patents
Method of exposing patternInfo
- Publication number
- JPS54118777A JPS54118777A JP2548178A JP2548178A JPS54118777A JP S54118777 A JPS54118777 A JP S54118777A JP 2548178 A JP2548178 A JP 2548178A JP 2548178 A JP2548178 A JP 2548178A JP S54118777 A JPS54118777 A JP S54118777A
- Authority
- JP
- Japan
- Prior art keywords
- exposing pattern
- exposing
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2548178A JPS54118777A (en) | 1978-03-08 | 1978-03-08 | Method of exposing pattern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2548178A JPS54118777A (en) | 1978-03-08 | 1978-03-08 | Method of exposing pattern |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54118777A true JPS54118777A (en) | 1979-09-14 |
Family
ID=12167235
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2548178A Pending JPS54118777A (en) | 1978-03-08 | 1978-03-08 | Method of exposing pattern |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54118777A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5721818A (en) * | 1980-07-14 | 1982-02-04 | Jeol Ltd | Exposure method for electron beam |
JPS60140822A (en) * | 1983-12-28 | 1985-07-25 | Hitachi Ltd | Electron-ray drawing device |
JPS6269518A (en) * | 1985-09-20 | 1987-03-30 | Mitsubishi Electric Corp | Electron beam exposure method |
JPH04297016A (en) * | 1991-03-26 | 1992-10-21 | Soltec:Kk | Preparing method of x-ray mask |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52117570A (en) * | 1976-03-30 | 1977-10-03 | Toshiba Corp | Position detecting method |
-
1978
- 1978-03-08 JP JP2548178A patent/JPS54118777A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52117570A (en) * | 1976-03-30 | 1977-10-03 | Toshiba Corp | Position detecting method |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5721818A (en) * | 1980-07-14 | 1982-02-04 | Jeol Ltd | Exposure method for electron beam |
JPS60140822A (en) * | 1983-12-28 | 1985-07-25 | Hitachi Ltd | Electron-ray drawing device |
JPS6269518A (en) * | 1985-09-20 | 1987-03-30 | Mitsubishi Electric Corp | Electron beam exposure method |
JPH04297016A (en) * | 1991-03-26 | 1992-10-21 | Soltec:Kk | Preparing method of x-ray mask |
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