JPS54118777A - Method of exposing pattern - Google Patents

Method of exposing pattern

Info

Publication number
JPS54118777A
JPS54118777A JP2548178A JP2548178A JPS54118777A JP S54118777 A JPS54118777 A JP S54118777A JP 2548178 A JP2548178 A JP 2548178A JP 2548178 A JP2548178 A JP 2548178A JP S54118777 A JPS54118777 A JP S54118777A
Authority
JP
Japan
Prior art keywords
exposing pattern
exposing
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2548178A
Other languages
Japanese (ja)
Inventor
Hisaaki Aizaki
Mamoru Nakasuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHO LSI GIJUTSU KENKYU KUMIAI
Priority to JP2548178A priority Critical patent/JPS54118777A/en
Publication of JPS54118777A publication Critical patent/JPS54118777A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
JP2548178A 1978-03-08 1978-03-08 Method of exposing pattern Pending JPS54118777A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2548178A JPS54118777A (en) 1978-03-08 1978-03-08 Method of exposing pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2548178A JPS54118777A (en) 1978-03-08 1978-03-08 Method of exposing pattern

Publications (1)

Publication Number Publication Date
JPS54118777A true JPS54118777A (en) 1979-09-14

Family

ID=12167235

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2548178A Pending JPS54118777A (en) 1978-03-08 1978-03-08 Method of exposing pattern

Country Status (1)

Country Link
JP (1) JPS54118777A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5721818A (en) * 1980-07-14 1982-02-04 Jeol Ltd Exposure method for electron beam
JPS60140822A (en) * 1983-12-28 1985-07-25 Hitachi Ltd Electron-ray drawing device
JPS6269518A (en) * 1985-09-20 1987-03-30 Mitsubishi Electric Corp Electron beam exposure method
JPH04297016A (en) * 1991-03-26 1992-10-21 Soltec:Kk Preparing method of x-ray mask

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52117570A (en) * 1976-03-30 1977-10-03 Toshiba Corp Position detecting method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52117570A (en) * 1976-03-30 1977-10-03 Toshiba Corp Position detecting method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5721818A (en) * 1980-07-14 1982-02-04 Jeol Ltd Exposure method for electron beam
JPS60140822A (en) * 1983-12-28 1985-07-25 Hitachi Ltd Electron-ray drawing device
JPS6269518A (en) * 1985-09-20 1987-03-30 Mitsubishi Electric Corp Electron beam exposure method
JPH04297016A (en) * 1991-03-26 1992-10-21 Soltec:Kk Preparing method of x-ray mask

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