JPS54150079A - Method of forming pattern - Google Patents
Method of forming patternInfo
- Publication number
- JPS54150079A JPS54150079A JP5907078A JP5907078A JPS54150079A JP S54150079 A JPS54150079 A JP S54150079A JP 5907078 A JP5907078 A JP 5907078A JP 5907078 A JP5907078 A JP 5907078A JP S54150079 A JPS54150079 A JP S54150079A
- Authority
- JP
- Japan
- Prior art keywords
- forming pattern
- pattern
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5907078A JPS54150079A (en) | 1978-05-18 | 1978-05-18 | Method of forming pattern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5907078A JPS54150079A (en) | 1978-05-18 | 1978-05-18 | Method of forming pattern |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54150079A true JPS54150079A (en) | 1979-11-24 |
Family
ID=13102714
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5907078A Pending JPS54150079A (en) | 1978-05-18 | 1978-05-18 | Method of forming pattern |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54150079A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59132619A (en) * | 1983-01-19 | 1984-07-30 | Toshiba Corp | Method and apparatus for forming resist pattern |
JPS59132618A (en) * | 1983-01-19 | 1984-07-30 | Toshiba Corp | Method and apparatus for forming resist pattern |
JPS59132127A (en) * | 1983-01-19 | 1984-07-30 | Toshiba Corp | Method and apparatus for forming resist pattern |
JPS59155932A (en) * | 1983-02-25 | 1984-09-05 | Mitsubishi Electric Corp | Forming method of minute pattern |
JPS6286726A (en) * | 1985-10-11 | 1987-04-21 | Mitsubishi Electric Corp | Formation of resist pattern |
JPH01270227A (en) * | 1988-04-20 | 1989-10-27 | Fujitsu Ltd | Resist film forming method |
-
1978
- 1978-05-18 JP JP5907078A patent/JPS54150079A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59132619A (en) * | 1983-01-19 | 1984-07-30 | Toshiba Corp | Method and apparatus for forming resist pattern |
JPS59132618A (en) * | 1983-01-19 | 1984-07-30 | Toshiba Corp | Method and apparatus for forming resist pattern |
JPS59132127A (en) * | 1983-01-19 | 1984-07-30 | Toshiba Corp | Method and apparatus for forming resist pattern |
JPH0480531B2 (en) * | 1983-01-19 | 1992-12-18 | Tokyo Shibaura Electric Co | |
JPS59155932A (en) * | 1983-02-25 | 1984-09-05 | Mitsubishi Electric Corp | Forming method of minute pattern |
JPS6286726A (en) * | 1985-10-11 | 1987-04-21 | Mitsubishi Electric Corp | Formation of resist pattern |
JPH01270227A (en) * | 1988-04-20 | 1989-10-27 | Fujitsu Ltd | Resist film forming method |
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