JPS54163680A - Pattern forming method - Google Patents
Pattern forming methodInfo
- Publication number
- JPS54163680A JPS54163680A JP7265578A JP7265578A JPS54163680A JP S54163680 A JPS54163680 A JP S54163680A JP 7265578 A JP7265578 A JP 7265578A JP 7265578 A JP7265578 A JP 7265578A JP S54163680 A JPS54163680 A JP S54163680A
- Authority
- JP
- Japan
- Prior art keywords
- forming method
- pattern forming
- pattern
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7265578A JPS54163680A (en) | 1978-06-15 | 1978-06-15 | Pattern forming method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7265578A JPS54163680A (en) | 1978-06-15 | 1978-06-15 | Pattern forming method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54163680A true JPS54163680A (en) | 1979-12-26 |
Family
ID=13495603
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7265578A Pending JPS54163680A (en) | 1978-06-15 | 1978-06-15 | Pattern forming method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54163680A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56111221A (en) * | 1980-01-25 | 1981-09-02 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Formation on mask for etching |
JPS57106029A (en) * | 1980-12-23 | 1982-07-01 | Nippon Telegr & Teleph Corp <Ntt> | Formation of high-heat-resistant, negative type resist pattern |
JPS57183028A (en) * | 1981-05-07 | 1982-11-11 | Oki Electric Ind Co Ltd | Manufacture of semiconductor device |
JPS5918634A (en) * | 1982-07-21 | 1984-01-31 | Nec Kyushu Ltd | Manufacturing device of semiconductor device |
JPS6034020A (en) * | 1983-08-04 | 1985-02-21 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS6041227A (en) * | 1983-08-15 | 1985-03-04 | Hitachi Ltd | Deformation preventive method of photo resist pattern |
JPS60244931A (en) * | 1984-05-21 | 1985-12-04 | Matsushita Electric Ind Co Ltd | Liquid crystal display device and its production |
JPS60244929A (en) * | 1984-05-21 | 1985-12-04 | Matsushita Electric Ind Co Ltd | Liquid crystal display device and its production |
-
1978
- 1978-06-15 JP JP7265578A patent/JPS54163680A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56111221A (en) * | 1980-01-25 | 1981-09-02 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Formation on mask for etching |
JPS57106029A (en) * | 1980-12-23 | 1982-07-01 | Nippon Telegr & Teleph Corp <Ntt> | Formation of high-heat-resistant, negative type resist pattern |
JPS57183028A (en) * | 1981-05-07 | 1982-11-11 | Oki Electric Ind Co Ltd | Manufacture of semiconductor device |
JPS5918634A (en) * | 1982-07-21 | 1984-01-31 | Nec Kyushu Ltd | Manufacturing device of semiconductor device |
JPS6034020A (en) * | 1983-08-04 | 1985-02-21 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS6041227A (en) * | 1983-08-15 | 1985-03-04 | Hitachi Ltd | Deformation preventive method of photo resist pattern |
JPH0466021B2 (en) * | 1983-08-15 | 1992-10-21 | Hitachi Ltd | |
JPS60244931A (en) * | 1984-05-21 | 1985-12-04 | Matsushita Electric Ind Co Ltd | Liquid crystal display device and its production |
JPS60244929A (en) * | 1984-05-21 | 1985-12-04 | Matsushita Electric Ind Co Ltd | Liquid crystal display device and its production |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB2035645B (en) | Pattern discrimination method | |
DE2965253D1 (en) | Method of forming patterns | |
JPS54103552A (en) | Pattern formation method | |
JPS54160754A (en) | Method | |
JPS5638888A (en) | Pattern forming method | |
JPS54161446A (en) | Method of making pattern | |
JPS54163680A (en) | Pattern forming method | |
JPS53135336A (en) | Pattern forming method | |
JPS54152294A (en) | Pattern preparing method | |
JPS5646290A (en) | Character pattern forming method | |
JPS54150079A (en) | Method of forming pattern | |
JPS54163896A (en) | Monoldene producing method | |
HK49784A (en) | Knitting method | |
JPS5651898A (en) | Method of forming pattern | |
JPS54155234A (en) | Forming multiilevel pattern | |
JPS5517533A (en) | Vibrationnproof method | |
JPS5359515A (en) | Concave pattern forming method | |
JPS5517532A (en) | Vibrationnproof method | |
JPS54115076A (en) | Method of printing pattern | |
GB2036110B (en) | Knitting method | |
JPS54115770A (en) | Multiilayer interconnection pattern formation method | |
JPS557309A (en) | Waterrproofing method | |
JPS54136733A (en) | Oillfence extending method | |
JPS5595392A (en) | Method of forming pattern | |
JPS54138734A (en) | Method of making geometric pattern |