JPS5313879A - Silicon mask for x-ray exposure and its production - Google Patents

Silicon mask for x-ray exposure and its production

Info

Publication number
JPS5313879A
JPS5313879A JP8796876A JP8796876A JPS5313879A JP S5313879 A JPS5313879 A JP S5313879A JP 8796876 A JP8796876 A JP 8796876A JP 8796876 A JP8796876 A JP 8796876A JP S5313879 A JPS5313879 A JP S5313879A
Authority
JP
Japan
Prior art keywords
ray exposure
production
silicon mask
ray
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8796876A
Other languages
Japanese (ja)
Other versions
JPS541625B2 (en
Inventor
Junji Matsui
Kiyoshi Sugibuchi
Toshiro Ono
Yoshiaki Mimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Nippon Telegraph and Telephone Corp
Original Assignee
NEC Corp
Nippon Telegraph and Telephone Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Telegraph and Telephone Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP8796876A priority Critical patent/JPS5313879A/en
Publication of JPS5313879A publication Critical patent/JPS5313879A/en
Publication of JPS541625B2 publication Critical patent/JPS541625B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To produce an X- ray exposure mask by making a soft X-ray transmission layer of Si of an extremely uniform film thickness without using any special etching solution.
COPYRIGHT: (C)1978,JPO&Japio
JP8796876A 1976-07-23 1976-07-23 Silicon mask for x-ray exposure and its production Granted JPS5313879A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8796876A JPS5313879A (en) 1976-07-23 1976-07-23 Silicon mask for x-ray exposure and its production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8796876A JPS5313879A (en) 1976-07-23 1976-07-23 Silicon mask for x-ray exposure and its production

Publications (2)

Publication Number Publication Date
JPS5313879A true JPS5313879A (en) 1978-02-07
JPS541625B2 JPS541625B2 (en) 1979-01-26

Family

ID=13929643

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8796876A Granted JPS5313879A (en) 1976-07-23 1976-07-23 Silicon mask for x-ray exposure and its production

Country Status (1)

Country Link
JP (1) JPS5313879A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55127559A (en) * 1979-03-26 1980-10-02 Fujitsu Ltd Blank mask for x-ray exposure and using method therefor

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5057656A (en) * 1973-09-17 1975-05-20
JPS52117558A (en) * 1976-03-30 1977-10-03 Toshiba Corp Soft x-ray exposure mask and its manufacturing method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5057656A (en) * 1973-09-17 1975-05-20
JPS52117558A (en) * 1976-03-30 1977-10-03 Toshiba Corp Soft x-ray exposure mask and its manufacturing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55127559A (en) * 1979-03-26 1980-10-02 Fujitsu Ltd Blank mask for x-ray exposure and using method therefor
JPS625332B2 (en) * 1979-03-26 1987-02-04 Fujitsu Ltd

Also Published As

Publication number Publication date
JPS541625B2 (en) 1979-01-26

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