JPS5329073A - Mask for x-ray exposure - Google Patents
Mask for x-ray exposureInfo
- Publication number
- JPS5329073A JPS5329073A JP10316176A JP10316176A JPS5329073A JP S5329073 A JPS5329073 A JP S5329073A JP 10316176 A JP10316176 A JP 10316176A JP 10316176 A JP10316176 A JP 10316176A JP S5329073 A JPS5329073 A JP S5329073A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- ray exposure
- ray
- memeber
- warp
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- X-Ray Techniques (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To reduce the warp of the mask caused by the temperature variation due to X-ray absorption etc., by embedding the X-ray absorbing memeber in the X-ray transmitting substrate.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10316176A JPS5329073A (en) | 1976-08-31 | 1976-08-31 | Mask for x-ray exposure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10316176A JPS5329073A (en) | 1976-08-31 | 1976-08-31 | Mask for x-ray exposure |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5329073A true JPS5329073A (en) | 1978-03-17 |
Family
ID=14346769
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10316176A Pending JPS5329073A (en) | 1976-08-31 | 1976-08-31 | Mask for x-ray exposure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5329073A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54142072A (en) * | 1978-04-27 | 1979-11-05 | Cho Lsi Gijutsu Kenkyu Kumiai | Method of fabricating xxray exposure mask |
JPS5858545A (en) * | 1981-10-02 | 1983-04-07 | Nippon Telegr & Teleph Corp <Ntt> | X-ray exposure mask and its manufacture |
JPH02299219A (en) * | 1989-04-20 | 1990-12-11 | Samsung Electron Co Ltd | X-ray lithoglaphy mask |
WO2002084400A3 (en) * | 2001-04-12 | 2003-09-04 | Univ Dundee | Preparation of photomasks |
-
1976
- 1976-08-31 JP JP10316176A patent/JPS5329073A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54142072A (en) * | 1978-04-27 | 1979-11-05 | Cho Lsi Gijutsu Kenkyu Kumiai | Method of fabricating xxray exposure mask |
JPS5858545A (en) * | 1981-10-02 | 1983-04-07 | Nippon Telegr & Teleph Corp <Ntt> | X-ray exposure mask and its manufacture |
JPH02299219A (en) * | 1989-04-20 | 1990-12-11 | Samsung Electron Co Ltd | X-ray lithoglaphy mask |
WO2002084400A3 (en) * | 2001-04-12 | 2003-09-04 | Univ Dundee | Preparation of photomasks |
US7115342B2 (en) | 2001-04-12 | 2006-10-03 | University Court Of The University Of Dundee | Preparation of photomasks |
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