JPS5329073A - Mask for x-ray exposure - Google Patents

Mask for x-ray exposure

Info

Publication number
JPS5329073A
JPS5329073A JP10316176A JP10316176A JPS5329073A JP S5329073 A JPS5329073 A JP S5329073A JP 10316176 A JP10316176 A JP 10316176A JP 10316176 A JP10316176 A JP 10316176A JP S5329073 A JPS5329073 A JP S5329073A
Authority
JP
Japan
Prior art keywords
mask
ray exposure
ray
memeber
warp
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10316176A
Other languages
Japanese (ja)
Inventor
Shusuke Kotake
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP10316176A priority Critical patent/JPS5329073A/en
Publication of JPS5329073A publication Critical patent/JPS5329073A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To reduce the warp of the mask caused by the temperature variation due to X-ray absorption etc., by embedding the X-ray absorbing memeber in the X-ray transmitting substrate.
COPYRIGHT: (C)1978,JPO&Japio
JP10316176A 1976-08-31 1976-08-31 Mask for x-ray exposure Pending JPS5329073A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10316176A JPS5329073A (en) 1976-08-31 1976-08-31 Mask for x-ray exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10316176A JPS5329073A (en) 1976-08-31 1976-08-31 Mask for x-ray exposure

Publications (1)

Publication Number Publication Date
JPS5329073A true JPS5329073A (en) 1978-03-17

Family

ID=14346769

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10316176A Pending JPS5329073A (en) 1976-08-31 1976-08-31 Mask for x-ray exposure

Country Status (1)

Country Link
JP (1) JPS5329073A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54142072A (en) * 1978-04-27 1979-11-05 Cho Lsi Gijutsu Kenkyu Kumiai Method of fabricating xxray exposure mask
JPS5858545A (en) * 1981-10-02 1983-04-07 Nippon Telegr & Teleph Corp <Ntt> X-ray exposure mask and its manufacture
JPH02299219A (en) * 1989-04-20 1990-12-11 Samsung Electron Co Ltd X-ray lithoglaphy mask
WO2002084400A3 (en) * 2001-04-12 2003-09-04 Univ Dundee Preparation of photomasks

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54142072A (en) * 1978-04-27 1979-11-05 Cho Lsi Gijutsu Kenkyu Kumiai Method of fabricating xxray exposure mask
JPS5858545A (en) * 1981-10-02 1983-04-07 Nippon Telegr & Teleph Corp <Ntt> X-ray exposure mask and its manufacture
JPH02299219A (en) * 1989-04-20 1990-12-11 Samsung Electron Co Ltd X-ray lithoglaphy mask
WO2002084400A3 (en) * 2001-04-12 2003-09-04 Univ Dundee Preparation of photomasks
US7115342B2 (en) 2001-04-12 2006-10-03 University Court Of The University Of Dundee Preparation of photomasks

Similar Documents

Publication Publication Date Title
JPS537134A (en) Recorder
JPS53148389A (en) Manufacture for semiconductor device
JPS5329073A (en) Mask for x-ray exposure
JPS5421172A (en) Manufacture for semiconductor device
JPS5321576A (en) Mask for x-ray exposure
JPS5314568A (en) Photolithography treatment system device
JPS5225576A (en) Exposure method of photo-resist
JPS5258374A (en) Improvement in sensitivity of positive type photo resist
JPS5312274A (en) Production of mask for x-ray exposure
JPS5311021A (en) Exposure control circuit
JPS5431282A (en) Pattern formation method
JPS52100982A (en) Semiconductor device
JPS5286778A (en) Mask aligning method for x-ray exposure
JPS52149976A (en) Mask for x-ray exposure
JPS5431281A (en) Optical exposure mask
JPS5429976A (en) Manufacture of semiconductor device
JPS5342678A (en) X-ray exposure method
JPS532071A (en) Manufacture of semiconductor device
JPS52112280A (en) X-ray exposure mask
JPS52117569A (en) Electronic beam exposure unit
JPS53105375A (en) Semiconductor device
JPS5391676A (en) Manufacture for semiconductor device
JPS5330277A (en) Mask for x-ray exposure
JPS5352857A (en) Turnbuckle
JPS52120761A (en) Exposure unit