JPS5342678A - X-ray exposure method - Google Patents

X-ray exposure method

Info

Publication number
JPS5342678A
JPS5342678A JP11745676A JP11745676A JPS5342678A JP S5342678 A JPS5342678 A JP S5342678A JP 11745676 A JP11745676 A JP 11745676A JP 11745676 A JP11745676 A JP 11745676A JP S5342678 A JPS5342678 A JP S5342678A
Authority
JP
Japan
Prior art keywords
exposure method
ray exposure
rays
wafers
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11745676A
Other languages
Japanese (ja)
Other versions
JPS5343022B2 (en
Inventor
Yasunao Saito
Satoru Nakayama
Toa Hayasaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP11745676A priority Critical patent/JPS5342678A/en
Publication of JPS5342678A publication Critical patent/JPS5342678A/en
Publication of JPS5343022B2 publication Critical patent/JPS5343022B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To control the exposure of X-rays to wafers based on the X-rays having transmitted through the through-hole provided to the wafers.
COPYRIGHT: (C)1978,JPO&Japio
JP11745676A 1976-09-30 1976-09-30 X-ray exposure method Granted JPS5342678A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11745676A JPS5342678A (en) 1976-09-30 1976-09-30 X-ray exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11745676A JPS5342678A (en) 1976-09-30 1976-09-30 X-ray exposure method

Publications (2)

Publication Number Publication Date
JPS5342678A true JPS5342678A (en) 1978-04-18
JPS5343022B2 JPS5343022B2 (en) 1978-11-16

Family

ID=14712104

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11745676A Granted JPS5342678A (en) 1976-09-30 1976-09-30 X-ray exposure method

Country Status (1)

Country Link
JP (1) JPS5342678A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5399770A (en) * 1977-02-10 1978-08-31 Hitachi Ltd Soft x-ray transfer mask

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4959576A (en) * 1972-06-29 1974-06-10

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4959576A (en) * 1972-06-29 1974-06-10

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5399770A (en) * 1977-02-10 1978-08-31 Hitachi Ltd Soft x-ray transfer mask

Also Published As

Publication number Publication date
JPS5343022B2 (en) 1978-11-16

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